Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.50 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.50 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.50 |
| ▸ | APP | P05067 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 4/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 4/20 | 0.31 |
| ▸ | CNR1 | P21554 | 2/20 | 0.31 |
| ▸ | PPARG | P37231 | 1/20 | 0.31 |
| ▸ | PPARD | Q03181 | 1/20 | 0.31 |
| ▸ | PPARA | Q07869 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1123521 | 1.00 | MAPT (0.50) | MAPTCACNA1BAPBA1APPLMNA | |
| SCHEMBL28250128 | 0.90 | MAPT (0.42) | MAPTCACNA1BAPBA1APPLMNA | |
| SCHEMBL2945907 | 0.89 | MAPT (0.59) | MAPTCACNA1BAPBA1APPCYP3A4 | |
| SCHEMBL2945906 | 0.89 | MAPT (0.59) | MAPTCACNA1BAPBA1APPCYP3A4 | |
| SCHEMBL28236783 | 0.87 | MAPT (0.41) | MAPTCACNA1BAPBA1APPLMNA | |
| SCHEMBL251146 | 0.85 | — | — | |
| SCHEMBL251147 | 0.85 | — | — | |
| Phenol SCHEMBL27906974 | 0.84 | APP (0.45) | MAPTCACNA1BAPBA1APPLMNA | |
| SCHEMBL7036625 | 0.82 | MAPT (0.52) | MAPTCACNA1BAPBA1APPCYP3A4 | |
| SCHEMBL7036628 | 0.82 | MAPT (0.52) | MAPTCACNA1BAPBA1APPCYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 230 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118772350-A | Nanometer oil displacement agent for high-temperature high-salt oil field and preparation method thereof | 河南正佳能源环保股份有限公司 | 2024-10-15 | — | — | CN | claimed |
| WO-2023214163-A1 | PROCESS FOR THE HYDROGENATION OF UNSATURATED ESTERS | JOHNSON MATTHEY PUBLIC LIMITED COMPANY (GB) | 2023-11-09 | — | — | WO | claimed |
| EP-3715416-B1 | RESIN COMPOSITION, MELT-FORMING MATERIAL, MULTILAYER STRUCTURE, AND AGRICULTURAL FILM | MITSUBISHI CHEM CORP (JP) | 2023-06-21 | — | — | EP | claimed |
| EP-3715417-B1 | ETHYLENE-VINYL ALCOHOL COPOLYMER COMPOSITION, MELT-FORMING MATERIAL, MULTILAYER STRUCTURE, AND CONTAINER | MITSUBISHI CHEM CORP (JP) | 2023-04-26 | — | — | EP | claimed |
| US-11161964-B2 | Ethylene-vinyl alcohol copolymer composition, melt-forming material, and multilayer structure | MITSUBISHI CHEMICAL CORPORATION (JP) | 2021-11-02 | — | — | US | claimed |
| CN-111978646-B | Artificial stone polishing waste/rubber compound capable of being ceramized and preparation method thereof | 华南理工大学 | 2021-05-14 | — | — | CN | claimed |
| CN-111978646-A | Artificial stone polishing waste/rubber compound capable of being ceramized and preparation method thereof | 华南理工大学 | 2020-11-24 | — | — | CN | claimed |
| EP-3715412-A1 | ETHYLENE VINYL ALCOHOL-BASED COPOLYMER COMPOSITION, MATERIAL FOR MELT MOLDING, AND MULTILAYERED STRUCTURE | Mitsubishi Chemical Corporation (JP) | 2020-09-30 | — | — | EP | claimed |
| US-20200207945-A1 | ETHYLENE-VINYL ALCOHOL COPOLYMER COMPOSITION, MELT-FORMING MATERIAL, AND MULTILAYER STRUCTURE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2020-07-02 | — | — | US | claimed |
| CN-111051424-A | Ethylene-vinyl alcohol copolymer composition, melt molding material, and multilayer structure | 三菱化学株式会社 | 2020-04-21 | — | — | CN | claimed |
| EP-0393273-A1 | Selective hydrolysis of copolymers of para-acetoxy styrene and dialkyl muconates or alkyl sorbates | HOECHST CELANESE CORPORATION (US) | 1990-10-24 | — | — | EP | claimed |
| US-4929537-A | Photoresist compositions based on hydroxystyrene copolymers | HOECHST CELANESE CORP. (US) | 1990-05-29 | — | — | US | claimed |
| US-4869994-A | SEMICONDUCTORS, PRINTING PLATES | HOECHST CELANESE CORP. (US) | 1989-09-26 | — | — | US | claimed |
| US-4857601-A | Selective hydrolysis of copolymers of para-acetoxy styrene and dialkyl muconates or alkyl sorbates | HOECHST CELANESE CORP. (US) | 1989-08-15 | — | — | US | claimed |
| EP-0326315-A2 | Photoresist compositions based on hydroxystyrene copolymers | HOECHST CELANESE CORPORATION (US) | 1989-08-02 | — | — | EP | claimed |
| EP-0326314-A2 | Photoresist compositions based on acetoxystyrene copolymers | HOECHST CELANESE CORPORATION (US) | 1989-08-02 | — | — | EP | claimed |
| US-4824758-A | WITH DIALKYL MUCONATES, ALKYL SORBATES, ALKADIENE MONOMERS OR ESTER OF UNSATURATED ACIDS WITH A PHOTOSENSITIZER | HOECHST CELANESE CORP (US) | 1989-04-25 | — | — | US | claimed |
| US-4775730-A | Copolymers of p-acetoxystyrene with any of certain polyunsaturated compounds | HOECHST CELANESE CORPORATION (US) | 1988-10-04 | — | — | US | claimed |
| US-4758643-A | Dental adhesive resin compositions | G-C DENTAL INDUSTRIAL CORP. (JP) | 1988-07-19 | — | — | US | claimed |
| US-4506095-A | Production of linear alkenoic acids and esters | CELANESE CORPORATION (US) | 1985-03-19 | — | — | US | claimed |