SCHEMBL112554

SCHEMBL112554

CCC1(C)CCCC1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3531548 0.93 GRIN1 (0.41)
SCHEMBL28747959 0.91 GRIN1 (0.40)
SCHEMBL14498933 0.85
Acetic Acid SCHEMBL8315534 0.84 GRIN2D (0.36)
SCHEMBL18707309 0.82 SIRT2 (0.33)
SCHEMBL15657479 0.79 TSHR (0.39)
SCHEMBL29044087 0.79
SCHEMBL4774211 0.79
SCHEMBL13017847 0.79 SIRT2 (0.38)
Ethoxycarbonyl Group SCHEMBL30818024 0.78 GRIN2D (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4844717-A KETONE AND AMIDE UNION OIL COMPANY OF CALIFORNIA (US) 1989-07-04 US claimed
US-4743273-A AMIDE AND KETONE, ANTIDEPOSIT AGENTS UNION OIL COMPANY OF CALIFORNIA (US) 1988-05-10 US claimed
CN-113135873-A Photodecomposable compounds, photoresist compositions and methods for making integrated circuit devices 三星电子株式会社 2021-07-20 CN disclosed
US-8426101-B2 Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition FUJIFILM CORPORATION (JP) 2013-04-23 US disclosed
US-20130011785-A1 PATTERN FORMING METHOD AND RESIST COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-10 US disclosed
US-8309341-B2 2-mercaptocyclopentanecarboxylic acid compounds, a process for their preparation and pharmaceutical compositions containing them Les Laboratories Server (FR) 2012-11-13 US disclosed
US-20120058436-A1 PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-03-08 US disclosed
US-8012665-B2 Positive photosensitive composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2011-09-06 US disclosed
US-20100330064-A1 2-mercaptocyclopentanecarboxylic acid compounds, a process for their preparation and pharmaceutical compositions containing them LES LABORATOIRES SERVIER (FR) 2010-12-30 US disclosed
US-20070141512-A1 Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition FUJIFILM CORPORATION (JP) 2007-06-21 US disclosed
US-6660769-B1 The presence of a substituted amine functional group in the C-3 position of 2,2-dialkyl-1,4-butyrolactones leads to a greater enhancement in GABA effects CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) (FR) 2003-12-09 US disclosed
US-4844717-A KETONE AND AMIDE UNION OIL COMPANY OF CALIFORNIA (US) 1989-07-04 US disclosed
US-4743273-A AMIDE AND KETONE, ANTIDEPOSIT AGENTS UNION OIL COMPANY OF CALIFORNIA (US) 1988-05-10 US disclosed