Fluoride

Fluoride

SCHEMBL11279192

F.F.F.F.F.F.[SbH3]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL4869901 1.00
Fluoride SCHEMBL37564 1.00
Fluoride SCHEMBL22158237 1.00
Fluoride SCHEMBL6328969 1.00
Fluoride SCHEMBL148663 1.00
Fluoride SCHEMBL11248211 0.82
Fluoride SCHEMBL2012681 0.82
Fluoride SCHEMBL11430614 0.82
Fluoride SCHEMBL21987873 0.82
Hydrochloric Acid SCHEMBL7635919 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0043706-A2 A short total synthesis of dihydrothebainone, dihydrocodeinone, and nordihydrocodeinone THE UNITED STATES OF AMERICA as represented by the Secretary United States Department of Commerce (US) 1982-01-13 EP claimed
US-20240173679-A1 Gas Separation Membranes FUJIFILM CORPORATION (JP) 2024-05-30 US disclosed
WO-2024056366-A1 GAS-SEPARATION MEMBRANES FUJIFILM MANUFACTURING EUROPE BV (NL) 2024-03-21 WO disclosed
WO-2024056365-A1 GAS-SEPARATION MEMBRANES FUJIFILM MANUFACTURING EUROPE BV (NL) 2024-03-21 WO disclosed
CN-117120153-A Gas separation membrane 富士胶片制造欧洲有限公司 2023-11-24 CN disclosed
CN-117098594-A gas separation membrane 富士胶片制造欧洲有限公司 2023-11-21 CN disclosed
US-20230115618-A1 Gas-Separation Membranes FUJIFILM CORPORATION (JP) 2023-04-13 US disclosed
WO-2022207361-A1 GAS SEPARATION MEMBRANES FUJIFILM MANUFACTURING EUROPE BV (NL) 2022-10-06 WO disclosed
WO-2021197912-A1 GAS-SEPARATION MEMBRANES FUJIFILM MANUFACTURING EUROPE BV (NL) 2021-10-07 WO disclosed
US-20190262780-A1 Composite Membranes FUJIFILM CORPORATION (JP) 2019-08-29 US disclosed
WO-2014125298-A1 GAS SEPARATION MEMBRANES FUJIFILM MANUFACTURING EUROPE BV (NL) 2014-08-21 WO disclosed
WO-2014125299-A1 GAS SEPARATION MEMBRANES FUJIFILM MANUFACTURING EUROPE BV (NL) 2014-08-21 WO disclosed
WO-2014001798-A1 GAS SEPARATION MEMBRANE WITH INTERMIXED LAYERS FUJIFILM MANUFACTURING EUROPE BV (NL) 2014-01-03 WO disclosed
WO-2014001796-A1 GAS SEPARATION MEMBRANES WITH INTERMIXED LAYERS FUJIFILM MANUFACTURING EUROPE BV (NL) 2014-01-03 WO disclosed
WO-2014001794-A1 COMPOSITE GAS SEPARATION MEMBRANE WITH DIALKYLSILOXANE INTERMEDIATE LAYER FUJIFILM MANUFACTURING EUROPE BV (NL) 2014-01-03 WO disclosed
WO-2014001791-A1 GAS SEPARATION MEMBRANE WITH AN INTERMEDIATE LAYER COMPRISING SILOXANE AND|METAL COMPLEXES FUJIFILM MANUFACTURING EUROPE BV (NL) 2014-01-03 WO disclosed
WO-2014001792-A1 GAS SEPARATION MEMBRANE WITH CROSS-LINKED DIALKYLSILOXANE IN INTERMEDIATE LAYER|AND THE PREPARATION THEREOF FUJIFILM MANUFACTURING EUROPE BV (NL) 2014-01-03 WO disclosed
WO-2014001795-A1 GAS SEPARATION MEMBRANE WITH INTERMEDIATE MONO-EPOXY FREE POLYSILOXANE LAYER FUJIFILM MANUFACTURING EUROPE BV (NL) 2014-01-03 WO disclosed
WO-2014001790-A1 GAS SEPARATION MEMBRANE WITH CROSS-LINKED DIALKYLSILOXANE IN INTERMEDIATE LAYER|AND THE PREPARATION THEREOF FUJIFILM MANUFACTURING EUROPE BV (NL) 2014-01-03 WO disclosed
WO-2012177122-A1 COMPOSITION TO PROTECT SURFACES AND ITS COATING METHOD HOLLAND NOVOCHEM TECHNICAL COATINGS B.V. (NL) 2012-12-27 WO disclosed