SCHEMBL11297066

SCHEMBL11297066

C=CC(=O)OCC(O)Cn1c(=O)n(CC(O)COC(=O)C=C)c(=O)n(CC(O)COC(=O)C=C)c1=O

nearest known ligand 0.47

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.47
ALDH1A1 P00352 4/20 0.37
TP53 P04637 3/20 0.37
HIF1A Q16665 3/20 0.37
CYP3A4 P08684 3/20 0.37
HSD17B10 Q99714 1/20 0.37
MAPK1 P28482 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
HPGD P15428 1/20 0.34
THRB P10828 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21944926 0.86 TP53 (0.46) TSHRTP53SMN1; SMN2
SCHEMBL21137124 0.80 TSHR (0.45) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL14370793 0.80 TSHR (0.44) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL12441893 0.79 CA1 (0.43)
SCHEMBL95157 0.79 TSHR (0.64) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL15499800 0.79 TSHR (0.43) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL4187283 0.79 TSHR (0.43) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL23810920 0.79 TSHR (0.33) TSHR
SCHEMBL10938362 0.78 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL8422176 0.76 TSHR (0.55) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11674051-B2 Stepped substrate coating composition containing compound having curable functional group NISSAN CHEMICAL CORPORATION (JP) 2023-06-13 US disclosed
US-11674051-B2 Stepped substrate coating composition containing compound having curable functional group NISSAN CHEMICAL CORPORATION (JP) 2023-06-13 US disclosed
US-11454889-B2 Crosslinkable compound-containing photocurable stepped substrate-coating composition NISSAN CHEMICAL CORPORATION (JP) 2022-09-27 US disclosed
US-11385546-B2 Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms NISSAN CHEMICAL CORPORATION (JP) 2022-07-12 US disclosed
US-20210024773-A1 STEPPED SUBSTRATE COATING COMPOSITION CONTAINING COMPOUND HAVING CURABLE FUNCTIONAL GROUP NISSAN CHEMICAL CORPORATION (JP) 2021-01-28 US disclosed
US-20200225585-A1 CROSSLINKABLE COMPOUND-CONTAINING PHOTOCURABLE STEPPED SUBSTRATE-COATING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2020-07-16 US disclosed
US-20190079397-A1 STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHOTOCROSSLINKING GROUP DUE TO UNSATURATED BOND BETWEEN CARBON ATOMS NISSAN CHEMICAL CORPORATION (JP) 2019-03-14 US disclosed
EP-1572814-B1 UV-CURABLE EPOXY ACRYLATES HUNTSMAN ADV MAT SWITZERLAND (CH) 2010-01-27 EP disclosed
US-20070231745-A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
US-20070231745-A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
EP-0013267-B1 METHOD OF MAKING LAMINATED PRODUCTS Österreichisches Forschungszentrum Seibersdorf Ges.m.b.H. (AT) 1982-06-23 EP disclosed
EP-0013267-A1 Method of making laminated products Österreichisches Forschungszentrum Seibersdorf Ges.m.b.H. (AT) 1980-07-09 EP disclosed