SCHEMBL1131334

SCHEMBL1131334

CC(O)C(C)(N)C(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL10484270 0.85 FFAR3 (0.39)
Acetic Acid SCHEMBL10484312 0.85 FFAR3 (0.39)
SCHEMBL28261372 0.83
SCHEMBL113474 0.80
Hydrochloric Acid SCHEMBL718321 0.77
SCHEMBL20870748 0.77
Water SCHEMBL142594 0.77
SCHEMBL2485264 0.77
Tert-Butylamine SCHEMBL28576928 0.75
SCHEMBL6995763 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114250117-B Effective reduction of post-CMP defects using a cleaning agent comprising an oxidizing agent 福吉米株式会社 2025-04-25 CN claimed
CN-114250117-A Effective post-CMP defect reduction using a cleaner comprising an oxidizing agent 福吉米株式会社 2022-03-29 CN claimed
CN-114250117-B Effective reduction of post-CMP defects using a cleaning agent comprising an oxidizing agent 福吉米株式会社 2025-04-25 CN disclosed
WO-2024256354-A1 DETERGENT COMPOSITIONS TAMINCO BV (BE) 2024-12-19 WO disclosed
CN-114250117-A Effective post-CMP defect reduction using a cleaner comprising an oxidizing agent 福吉米株式会社 2022-03-29 CN disclosed
CN-104514019-A Cyanide-free silvering electroplating solution and electroplating method WUXI HUAYE IRON & STEEL CO LTD 2015-04-15 CN disclosed
US-20130184400-A1 Coating of substrates with curable fluorinated copolymers DAIKIN INDUSTRIES, LTD. (CN) 2013-07-18 US disclosed
US-8168694-B2 Ink composition, ink set, ink for inkjet recording, ink set for inkjet recording, and ink cartridge for inkjet recording FUJIFILM CORPORATION (JP) 2012-05-01 US disclosed
EP-1812381-B1 ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE SHOWA DENKO KK (JP) 2011-02-16 EP disclosed
US-20090306284-A1 Curable Fluorinated Copolymers and Coatings and Processes Thereof LANXESS DEUTSCHLAND GMBH (DE) 2009-12-10 US disclosed
US-7579066-B2 Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth) acrylate polymer and its use SHOWA DENKO K.K. (JP) 2009-08-25 US disclosed
WO-2006049264-A1 ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE SHOWA DENKO K.K. (JP) 2006-05-11 WO disclosed
US-4829090-A SECONDARY AMINES, ANTITUMOR BURROUGHS WELLCOME CO. (US) 1989-05-09 US disclosed
US-4810727-A ANTITUMOR BURROUGHS WELLCOME CO. (US) 1989-03-07 US disclosed
US-4719048-A ANTITUMOR BURROUGHS WELLCOME CO. (US) 1988-01-12 US disclosed
US-4719046-A ANTITUMOR BURROUGHS WELLCOME CO. (US) 1988-01-12 US disclosed
EP-0125702-B1 POLYCYCLIC AROMATIC COMPOUNDS THE WELLCOME FOUNDATION LIMITED (GB) 1987-08-12 EP disclosed
EP-0125702-A2 Polycyclic aromatic compounds THE WELLCOME FOUNDATION LIMITED (GB) 1984-11-21 EP disclosed
US-4297251-A STABLE DETERGENT OF AN ALKALINE SOLUTION OF SULFATE-CONTAINING ANIONIC SURFACTANT AND VEGETABLE LECITHIN THE PROCTER & GAMBLE COMPANY (US) 1981-10-27 US disclosed
US-4070309-A ANIONIC SURFACTANTS THE PROCTER & GAMBLE COMPANY (US) 1978-01-24 US disclosed