SCHEMBL11367244

SCHEMBL11367244

O=C(NC1CCCCC1)c1cc(NC(=O)C2CCCCC2)cc(C(=O)NC2CCCCC2)c1

nearest known ligand 0.54

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.54
KMT2A Q03164 2/20 0.54
LMNA P02545 1/20 0.54
NPSR1 Q6W5P4 1/20 0.54
ALDH1A1 P00352 1/20 0.54
HPGD P15428 2/20 0.51
PTPN1 P18031 1/20 0.51
HSD17B10 Q99714 1/20 0.51
KCNK3 O14649 1/20 0.51
KCNK9 Q9NPC2 1/20 0.51
HTR2B P41595 1/20 0.51
NPC1 O15118 4/20 0.49
RAB9A P51151 4/20 0.49
CYP1A2 P05177 1/20 0.49
CYP2C19 P33261 1/20 0.49
SMN1; SMN2 Q16637 1/20 0.49
GRM5 P41594 1/20 0.48
ACKR3 P25106 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13139967 1.00 MEN1 (0.54) MEN1KMT2ALMNANPSR1ALDH1A1
SCHEMBL1948547 0.97 KCNK3 (0.55) MEN1KMT2ALMNANPSR1ALDH1A1
SCHEMBL1948001 0.97 KCNK3 (0.55) MEN1KMT2ALMNANPSR1ALDH1A1
SCHEMBL1946809 0.97 KCNK3 (0.55) MEN1KMT2ALMNANPSR1ALDH1A1
SCHEMBL1949713 0.95 MEN1 (0.55) MEN1KMT2ALMNANPSR1ALDH1A1
SCHEMBL22270303 0.86 KCNK3 (0.48) MEN1KMT2ALMNANPSR1ALDH1A1
SCHEMBL123085 0.85 PTPN1 (0.64) MEN1KMT2ALMNANPSR1HPGD
SCHEMBL28956652 0.85 PTPN1 (0.64) MEN1KMT2ALMNANPSR1HPGD
SCHEMBL435720 0.83 KMT2A (0.69) MEN1KMT2AALDH1A1HPGDHSD17B10
SCHEMBL2915946 0.83 KMT2A (0.69) MEN1KMT2AALDH1A1HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1592738-B1 RESIN COMPOSITIONS CIBA HOLDING INC (CH) 2020-07-29 EP disclosed
US-8415416-B2 Electret materials BASF SE (DE) 2013-04-09 US disclosed
US-20130012091-A1 Electret Materials BASF SE (DE) 2013-01-10 US disclosed
US-20120184170-A1 Electret Materials CHIN HUI (US) 2012-07-19 US disclosed
US-20110230109-A1 Electret Materials CHIN HUI 2011-09-22 US disclosed
US-7790793-B2 Amide nucleating agent compositions CIBA SPECIALTY CHEM. CORP. (US) 2010-09-07 US disclosed
US-7790793-B2 Amide nucleating agent compositions CIBA SPECIALTY CHEM. CORP. (US) 2010-09-07 US disclosed
WO-2008122525-A1 ELECTRET MATERIALS BASF SE (CH) 2008-10-16 WO disclosed
US-20080249269-A1 Electret materials CIBA CORP. 2008-10-09 US disclosed
US-20080249269-A1 Electret materials CIBA CORP. 2008-10-09 US disclosed
US-20070149663-A1 Resin compositions CIBA SPECIALTY CHEMICALS CORP. 2007-06-28 US disclosed
US-20070149663-A1 Resin compositions CIBA SPECIALTY CHEMICALS CORP. 2007-06-28 US disclosed