SCHEMBL11413481

SCHEMBL11413481

O=S(=O)(O)c1cc(O)c(O)c(S(=O)(=O)O)c1.[NaH].[NaH].[PbH2]

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ING2 Q9H160 1/20 0.45
NT5E P21589 3/20 0.43
ALDH1A1 P00352 4/20 0.42
HSD17B10 Q99714 4/20 0.42
PRMT1 Q99873 2/20 0.42
NSD2 O96028 4/20 0.40
CASP6 P55212 4/20 0.40
DUSP3 P51452 2/20 0.40
PTPN5 P54829 2/20 0.40
PTPN11 Q06124 2/20 0.40
KDM4E B2RXH2 1/20 0.39
HPGD P15428 1/20 0.39
CASP7 P55210 2/20 0.38
CYP2C9 P11712 2/20 0.38
CASP1 P29466 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
CYP2C19 P33261 1/20 0.38
LCK P06239 1/20 0.38
FYN P06241 1/20 0.38
GAA P10253 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL772207 0.98 ING2 (0.47) ING2NT5EALDH1A1HSD17B10PRMT1
SCHEMBL17627830 0.98 ING2 (0.47) ING2NT5EALDH1A1HSD17B10PRMT1
SCHEMBL22221 0.98 ING2 (0.47) ING2NT5EALDH1A1HSD17B10PRMT1
SCHEMBL28747107 0.98 ING2 (0.47) ING2NT5EALDH1A1HSD17B10PRMT1
SCHEMBL3309996 0.98 ING2 (0.47) ING2NT5EALDH1A1HSD17B10PRMT1
Water SCHEMBL5097055 0.96 ING2 (0.45) ING2NT5EALDH1A1HSD17B10PRMT1
Water SCHEMBL3205307 0.96 ING2 (0.45) ING2NT5EALDH1A1HSD17B10PRMT1
Water SCHEMBL5097425 0.96 ING2 (0.45) ING2NT5EALDH1A1HSD17B10PRMT1
SCHEMBL27856189 0.96 ING2 (0.45) ING2NT5EALDH1A1HSD17B10PRMT1
SCHEMBL9960460 0.96 ING2 (0.45) ING2NT5EALDH1A1HSD17B10PRMT1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4194954-A Electrolytic etch preparation of semiconductor surfaces THE POST OFFICE (GB) 1980-03-25 US disclosed