Abietic Acid

Abietic Acid

SCHEMBL11416456

CC(C)C1=CC2=CC[C@@H]3[C@](C)(CCC[C@@]3(C)C(=O)O)[C@H]2CC1.OCCOCCO

nearest known ligand 0.83

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD17B10 Q99714 3/20 0.83
▸ ALOX15 P16050 3/20 0.83
▸ PDK1 Q15118 2/20 0.83
▸ PDK2 Q15119 2/20 0.83
▸ PDK3 Q15120 2/20 0.83
▸ PDK4 Q16654 2/20 0.83
▸ LMNA P02545 2/20 0.83
▸ ALDH1A1 P00352 2/20 0.83
▸ CYP2C9 P11712 2/20 0.83
▸ CYP2C19 P33261 2/20 0.83
▸ MAPT P10636 2/20 0.83
▸ SLCO1B3 Q9NPD5 1/20 0.83
▸ SLCO1B1 Q9Y6L6 1/20 0.83
▸ GABRA1 P14867 1/20 0.83
▸ GABRB2 P47870 1/20 0.83
▸ CYP3A4 P08684 1/20 0.83
▸ KDM4E B2RXH2 1/20 0.83
▸ MAPK1 P28482 1/20 0.65
▸ MEN1 O00255 1/20 0.55
▸ KMT2A Q03164 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Abietic Acid SCHEMBL11416458 1.00 HSD17B10 (0.83) HSD17B10ALOX15PDK1PDK2PDK3
Abietic Acid SCHEMBL8898401 0.91 HSD17B10 (0.92) HSD17B10ALOX15PDK1PDK2PDK3
Abietic Acid SCHEMBL8740558 0.91 HSD17B10 (0.92) HSD17B10ALOX15PDK1PDK2PDK3
Abietic Acid SCHEMBL678976 0.91 HSD17B10 (1.00) HSD17B10ALOX15PDK1PDK2PDK3
Abietic Acid SCHEMBL19798150 0.91 HSD17B10 (1.00) HSD17B10ALOX15PDK1PDK2PDK3
Abietic Acid SCHEMBL10038576 0.91 HSD17B10 (1.00) HSD17B10ALOX15PDK1PDK2PDK3
Abietic Acid SCHEMBL16268652 0.91 HSD17B10 (1.00) HSD17B10ALOX15PDK1PDK2PDK3
Abietic Acid SCHEMBL28888 0.91 HSD17B10 (1.00) HSD17B10ALOX15PDK1PDK2PDK3
Abietic Acid SCHEMBL9892651 0.91 HSD17B10 (1.00) HSD17B10ALOX15PDK1PDK2PDK3
Abietic Acid SCHEMBL14700492 0.91 HSD17B10 (1.00) HSD17B10ALOX15PDK1PDK2PDK3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4197132-A Photopolymer photoresist composition containing rosin tackifier adhesion improver and chlorinated polyolefin FUJI PHOTO FILM CO., LTD. (JP) 1980-04-08 — — US disclosed
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