⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4582829 | 1.00 | — | — | |
| SCHEMBL875883 | 1.00 | — | — | |
| SCHEMBL9617082 | 0.82 | — | — | |
| SCHEMBL10495152 | 0.82 | — | — | |
| SCHEMBL4130934 | 0.82 | — | — | |
| SCHEMBL29538745 | 0.71 | — | — | |
| Ammonia Solution, Strong SCHEMBL28997679 | 0.71 | — | — | |
| SCHEMBL30135586 | 0.71 | — | — | |
| SCHEMBL10773596 | 0.71 | — | — | |
| SCHEMBL29548483 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 555 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024134907-A1 | SUBSTRATE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SUBSTRATE TREATMENT SYSTEM, AND PROGRAM | 株式会社KOKUSAI ELECTRIC | 2024-06-27 | — | — | WO | claimed |
| CN-118103960-A | Film forming method, semiconductor device manufacturing method, film forming apparatus, and program | 株式会社国际电气 | 2024-05-28 | — | — | CN | claimed |
| CN-114807903-B | Substrate processing method, semiconductor device manufacturing method, substrate processing apparatus, and recording medium | 株式会社国际电气 | 2024-04-09 | — | — | CN | claimed |
| WO-2024047713-A1 | SUBSTRATE PROCESSING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND PROGRAM | 株式会社KOKUSAI ELECTRIC | 2024-03-07 | — | — | WO | claimed |
| WO-2023176020-A1 | SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, PROGRAM, AND SUBSTRATE PROCESSING DEVICE | 株式会社KOKUSAI ELECTRIC | 2023-09-21 | — | — | WO | claimed |
| CN-110660663-B | Etching method and etching apparatus | 株式会社日立高新技术 | 2023-06-16 | — | — | CN | claimed |
| CN-116180045-A | Cleaning method of ultraviolet curing cavity | 拓荆科技(上海)有限公司 | 2023-05-30 | — | — | CN | claimed |
| CN-115747761-A | Film curing method | 拓荆科技(上海)有限公司 | 2023-03-07 | — | — | CN | claimed |
| CN-115110059-A | Method for manufacturing semiconductor device, method for processing substrate, recording medium, and substrate processing apparatus | 株式会社国际电气 | 2022-09-27 | — | — | CN | claimed |
| CN-114807903-A | Method for manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium | 株式会社国际电气 | 2022-07-29 | — | — | CN | claimed |
| EP-1265279-A1 | FLASH MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR FORMING DIELECTRIC FILM | OHMI, Tadahiro (JP) | 2002-12-11 | — | — | EP | claimed |
| US-20020160622-A1 | METHODS OF HEAT TREATMENT AND HEAT TREATMENT APPARATUS FOR SILICON OXIDE FILMS | YAMAZAKI SHUNPEI (JP) | 2002-10-31 | — | — | US | claimed |
| US-20020040847-A1 | Modifying dielectric overcoating on substrate | FOUNDATION FOR ADVANCEMENT OF INTERNATIONAL SCIENCE (JP) | 2002-04-11 | — | — | US | claimed |
| US-20020025691-A1 | Flash memory device and a fabrication process thereof, method of forming a dielectric film | FOUNDATION FOR ADVANCEMENT OF INTERNATIONAL SCIENCE (JP) | 2002-02-28 | — | — | US | claimed |
| US-20020014666-A1 | Semiconductor device formed on (111) surface of a si crystal and fabrication process thereof | TADAHIRO, OHMI (JP) | 2002-02-07 | — | — | US | claimed |
| US-5840600-A | Method for producing semiconductor device and apparatus for treating semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 1998-11-24 | — | — | US | claimed |
| US-5817549-A | Method for manufacturing a semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 1998-10-06 | — | — | US | claimed |
| US-5095129-A | Antiglucocorticoid, antimineralcorticoid, antiandrogen | SCHERING AKTIENGESELLSCHAFT (DE) | 1992-03-10 | — | — | US | claimed |
| US-4717602-A | Method for producing silicon nitride layers | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 1988-01-05 | — | — | US | claimed |
| US-4704300-A | Method for producing silicon nitride layer | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 1987-11-03 | — | — | US | claimed |