SCHEMBL11572352

SCHEMBL11572352

CN1CCSC1=CC=C(C#N)C#N

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 16/20 0.40
▸ KMT2A Q03164 16/20 0.40
▸ MAPT P10636 13/20 0.40
▸ ALDH1A1 P00352 8/20 0.40
▸ NPC1 O15118 5/20 0.40
▸ RAB9A P51151 5/20 0.40
▸ SMN1; SMN2 Q16637 5/20 0.40
▸ MAPK1 P28482 4/20 0.40
▸ LMNA P02545 2/20 0.40
▸ GAA P10253 1/20 0.40
▸ STAT1 P42224 1/20 0.39
▸ TNNI3 P19429 4/20 0.38
▸ TNNT2 P45379 4/20 0.38
▸ TNNC1 P63316 4/20 0.38
▸ USP2 O75604 6/20 0.37
▸ INMT O95050 3/20 0.36
▸ CYP1A2 P05177 1/20 0.35
▸ CYP2C9 P11712 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ L3MBTL1 Q9Y468 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14063793 0.79 MEN1 (0.46) MEN1KMT2AMAPTALDH1A1NPC1
SCHEMBL13301528 0.71 KMT2A (0.46) MEN1KMT2AMAPTALDH1A1SMN1; SMN2
SCHEMBL11322458 0.70 MEN1 (0.42) MEN1KMT2AMAPTALDH1A1NPC1
SCHEMBL11589277 0.69 MEN1 (0.38) MEN1KMT2AMAPTALDH1A1NPC1
SCHEMBL11572350 0.67 MEN1 (0.43) MEN1KMT2AMAPTALDH1A1SMN1; SMN2
SCHEMBL13683587 0.65 MEN1 (0.44) MEN1KMT2AMAPTALDH1A1NPC1
SCHEMBL25477352 0.65 MEN1 (0.32) MEN1KMT2AMAPTALDH1A1LMNA
SCHEMBL17897729 0.65 MEN1 (0.32) MEN1KMT2AMAPTALDH1A1LMNA
SCHEMBL19240017 0.63 MEN1 (0.38) MEN1KMT2AMAPTALDH1A1NPC1
SCHEMBL13889560 0.62 MAPT (0.52) MEN1KMT2AMAPTALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-54095688-A — — None — — JP disclosed
CN-108700835-B Resist pattern forming method and resist 日本瑞翁株式会社 2022-05-27 — — CN disclosed
JP-S5495688-A PHOTOPOLYMERIZABLE COMPOSITION FUJI PHOTO FILM CO LTD 1979-07-28 — — JP disclosed
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