Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 6/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 2/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | HMGCR | P04035 | 2/20 | 0.36 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10966364 | 0.92 | GAA (0.51) | GAAKMT2AMEN1CYP1A2CYP2C9 | |
| SCHEMBL40193 | 0.92 | GAA (0.51) | GAAKMT2AMEN1CYP1A2CYP2C9 | |
| SCHEMBL2862674 | 0.91 | GAA (0.51) | GAAKMT2AMEN1CYP1A2CYP2C9 | |
| SCHEMBL30504879 | 0.91 | GAA (0.51) | GAAKMT2AMEN1CYP1A2CYP2C9 | |
| Ethylene Glycol SCHEMBL5305520 | 0.87 | GAA (0.48) | GAAKMT2AMEN1CYP1A2CYP2C9 | |
| SCHEMBL1083078 | 0.87 | GAA (0.56) | GAAKMT2AMEN1CYP1A2CYP2C9 | |
| SCHEMBL25813121 | 0.87 | GAA (0.43) | GAAKMT2AMEN1CYP1A2CYP2C9 | |
| SCHEMBL7245953 | 0.87 | GAA (0.43) | GAAKMT2AMEN1CYP1A2CYP2C9 | |
| SCHEMBL551089 | 0.86 | GAA (0.51) | GAAKMT2AMEN1CYP1A2CYP2C9 | |
| SCHEMBL29586862 | 0.86 | GAA (0.51) | GAAKMT2AMEN1CYP1A2CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4101326-A | Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters | EASTMAN KODAK COMPANY (US) | 1978-07-18 | — | — | US | claimed |
| US-4101326-A | Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters | EASTMAN KODAK COMPANY (US) | 1978-07-18 | — | — | US | disclosed |