SCHEMBL1160495

SCHEMBL1160495

CC/C=C(\C)C(=O)Nc1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAPRT Q6XQN6 1/20 0.52
HSD17B10 Q99714 1/20 0.52
MAPT P10636 5/20 0.46
GAA P10253 1/20 0.46
NPC1 O15118 4/20 0.46
RAB9A P51151 4/20 0.46
KMT2A Q03164 3/20 0.46
POLB P06746 2/20 0.46
TAAR1 Q96RJ0 1/20 0.46
SMN1; SMN2 Q16637 4/20 0.45
ALDH1A1 P00352 4/20 0.45
TP53 P04637 1/20 0.45
EPHX1 P07099 1/20 0.45
TSHR P16473 1/20 0.45
EPHX2 P34913 1/20 0.45
CDK9 P50750 1/20 0.45
CLK4 Q9HAZ1 1/20 0.45
KDM4E B2RXH2 2/20 0.45
MEN1 O00255 2/20 0.45
HPGD P15428 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1160496 1.00 NAPRT (0.52) NAPRTHSD17B10MAPTGAANPC1
SCHEMBL19501286 0.94 NPC1 (0.57) NAPRTHSD17B10MAPTGAANPC1
SCHEMBL19501548 0.89 KMT2A (0.55) HSD17B10MAPTNPC1RAB9AKMT2A
SCHEMBL19501656 0.86 KMT2A (0.53) MAPTGAANPC1RAB9AKMT2A
SCHEMBL10718706 0.84 NAPRT (0.46) NAPRTHSD17B10MAPTGAANPC1
SCHEMBL10718696 0.84 NAPRT (0.46) NAPRTHSD17B10MAPTGAANPC1
SCHEMBL23507047 0.81 NAPRT (0.47) NAPRTHSD17B10MAPTNPC1RAB9A
SCHEMBL10523697 0.81 SMN1; SMN2 (0.50) NPC1RAB9AKMT2APOLBSMN1; SMN2
SCHEMBL10523694 0.81 SMN1; SMN2 (0.50) NPC1RAB9AKMT2APOLBSMN1; SMN2
SCHEMBL2322470 0.81 NAPRT (0.59) NAPRTHSD17B10MAPTGAANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021039407-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2021-03-04 WO disclosed
EP-2459519-A1 MACROPHOTOINITIATORS BASF SE (DE) 2012-06-06 EP disclosed
WO-2011012560-A1 MACROPHOTOINITIATORS BASF SE (DE) 2011-02-03 WO disclosed
EP-1782127-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR EASTMAN KODAK COMPANY (US) 2007-05-09 EP disclosed
WO-2006023667-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR EASTMAN KODAK COMPANY (US) 2006-03-02 WO disclosed