⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butanol SCHEMBL8863956 | 0.92 | — | — | |
| Butanol SCHEMBL28271138 | 0.88 | — | — | |
| Butanol SCHEMBL55899 | 0.88 | — | — | |
| Butanol SCHEMBL1418 | 0.88 | — | — | |
| Butanol SCHEMBL55049 | 0.88 | — | — | |
| Butanol SCHEMBL2012224 | 0.88 | TSHR (1.00) | — | |
| Butanol SCHEMBL9506830 | 0.85 | TSHR (0.56) | — | |
| Butanol SCHEMBL7908046 | 0.84 | — | — | |
| Butanol SCHEMBL1554783 | 0.84 | — | — | |
| Butanol SCHEMBL22118216 | 0.84 | TSHR (0.91) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110361941-A | A kind of positive photoresist stripper, preparation method and application | 上海新阳半导体材料股份有限公司 | 2019-10-22 | — | — | CN | claimed |
| CN-110262199-A | A kind of negtive photoresist stripper, preparation method and application | 上海新阳半导体材料股份有限公司 | 2019-09-20 | — | — | CN | claimed |
| CN-104024394-B | method and composition for removing material from a substrate | 慧盛材料美国有限责任公司 | 2019-07-16 | — | — | CN | claimed |
| CN-110361941-A | A kind of positive photoresist stripper, preparation method and application | 上海新阳半导体材料股份有限公司 | 2019-10-22 | — | — | CN | disclosed |
| CN-110262199-A | A kind of negtive photoresist stripper, preparation method and application | 上海新阳半导体材料股份有限公司 | 2019-09-20 | — | — | CN | disclosed |
| CN-104024394-B | method and composition for removing material from a substrate | 慧盛材料美国有限责任公司 | 2019-07-16 | — | — | CN | disclosed |
| CN-107690488-B | Multilayer film etching solution and etching concentrate and engraving method | 松下知识产权经营株式会社 | 2019-03-01 | — | — | CN | disclosed |
| CN-109415818-A | Etching solution for copper thick film | 松下知识产权经营株式会社 | 2019-03-01 | — | — | CN | disclosed |
| CN-106460197-B | Etching solution and etching concentrated solution for multilayer film and etching method | 松下知识产权经营株式会社 | 2019-02-22 | — | — | CN | disclosed |
| CN-106255777-B | Etching solution for multilayer film containing molybdenum and copper, etching concentrate, and etching method | 松下知识产权经营株式会社 | 2018-03-20 | — | — | CN | disclosed |
| CN-107690488-A | Multilayer film etching solution and etching concentrate and engraving method | 松下知识产权经营株式会社 | 2018-02-13 | — | — | CN | disclosed |
| CN-103959172-A | Process for removing substances from substrates | DYNALOY LLC | 2014-07-30 | — | — | CN | disclosed |
| CN-100472331-C | Dephotoresist agent | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-03-25 | — | — | CN | disclosed |
| CN-101093364-A | Stripping liquid for photo-induced resist and base plate processing method using the same | TOKYO OHKA KOGYO CO LTD (JP) | 2007-12-26 | — | — | CN | disclosed |
| CN-100338530-C | Method for releasing resist | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-09-19 | — | — | CN | disclosed |
| CN-1312535-C | Optical photoresist stripping composition and cleaning composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-04-25 | — | — | CN | disclosed |
| CN-1578932-A | Method for releasing resist | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-02-09 | — | — | CN | disclosed |
| CN-1517803-A | Dephotoresist agent | 三菱瓦斯化学株式会社 | 2004-08-04 | — | — | CN | disclosed |
| CN-1444103-A | Optical photoresist stripping composition and cleaning composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-09-24 | — | — | CN | disclosed |
| US-4103087-A | REACTING TERTIARY AMINOALKANOL WITH A SECONDARY AMINE IN PRESENCE OF AN ALUMINUM PHOSPHATE CATALYST | TEXACO DEVELOPMENT CORPORATION (US) | 1978-07-25 | — | — | US | disclosed |