SCHEMBL1170516

SCHEMBL1170516

[CH2]CC(C)[CH]F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18401 0.69
SCHEMBL170891 0.69
SCHEMBL139163 0.69
SCHEMBL8115693 0.67
SCHEMBL1691242 0.67
SCHEMBL10436509 0.67
SCHEMBL2382620 0.67
SCHEMBL9324029 0.65
SCHEMBL14812290 0.65
SCHEMBL2120982 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10369248-B2 Porous polymer composites THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) 2019-08-06 US disclosed
US-9671692-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9575408-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-21 US disclosed
US-20160244400-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-25 US disclosed
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-07-07 US disclosed
US-20160030625-A1 POROUS POLYMER COMPOSITES ARMY, UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE, THE 2016-02-04 US disclosed
US-20150176137-A1 METHODS FOR PREPARING SUBSTRATE CORED-METAL LAYER SHELLED METAL ALLOYS UNIVERSITY OF CONNECTICUT 2015-06-25 US disclosed
US-7951348-B2 p-Type transparent conducting oxides and methods for preparation NORTHWESTERN UNIVERSITY (US) 2011-05-31 US disclosed
US-7887778-B2 Manganese oxide nanowires, films, and membranes and methods of making THE UNIVERSITY OF CONNECTICUT (US) 2011-02-15 US disclosed
US-20090011235-A1 MANGANESE OXIDE NANOWIRES, FILMS, AND MEMBRANES AND METHODS OF MAKING THE UNIVERSITY OF CONNECTICUT (US) 2009-01-08 US disclosed
US-7438887-B2 A single crystal ultra-long nanowire includes an ordered porous manganese oxide-based octahedral molecular sieve in the form of a layer; microporous network; axially aligned layers; superior thermal and chemical properties to organic polymers; decreased brittleness; increased mechanical properties THE UNIVERSITY OF CONNECTICUT (US) 2008-10-21 US disclosed
US-20060104893-A1 p-Type transparent conducting oxides and methods for preparation UNITED STATES DEPARTMENT OF ENERGY 2006-05-18 US disclosed
WO-2006029230-A1 MANGANESE OXIDE NANOWIRES, FILMS, AND MEMBRANES AND METHODS OF MAKING UNIVERSITY OF CONNECTICUT (US) 2006-03-16 WO disclosed
US-20060049101-A1 A single crystal ultra-long nanowire includes an ordered porous manganese oxide-based octahedral molecular sieve in the form of a layer; microporous network; axially aligned layers; superior thermal and chemical properties to organic polymers; decreased brittleness; increased mechanical properties UNITED STATES DEPARTMENT OF ENERGY 2006-03-09 US disclosed
WO-2006023521-A2 MULTINARY BULK AND THIN FILM ALLOYS AND METHODS OF MAKING UNIVERSITY OF CONNECTICUT (US) 2006-03-02 WO disclosed
US-20060035101-A1 Multinary bulk and thin film alloys and methods of making CONNECTICUT, UNIVERSITY OF THE 2006-02-16 US disclosed
US-6979435-B1 p-Type transparent conducting oxides and methods for preparation NORTHWESTERN UNIVERSITY (US) 2005-12-27 US disclosed