SCHEMBL11721997

SCHEMBL11721997

CCCCC1CCC2OC2C1

nearest known ligand 0.45

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.45
POLB P06746 1/20 0.39
HPGD P15428 1/20 0.39
HTT P42858 2/20 0.38
LMNA P02545 1/20 0.38
MAPK1 P28482 1/20 0.38
PKM P14618 1/20 0.35
MAPT P10636 1/20 0.34
TLR4 O00206 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11777444 0.94 CYP1A2 (0.41) CYP1A2HTTPKMMEN1KMT2A
SCHEMBL24567415 0.92 EPHX1 (0.42) CYP1A2HTTPKMMEN1KMT2A
SCHEMBL11775836 0.92 EPHX1 (0.42) CYP1A2HTTPKMMEN1KMT2A
SCHEMBL27735675 0.92 EPHX1 (0.42) CYP1A2HTTPKMMEN1KMT2A
SCHEMBL11777705 0.92 EPHX1 (0.42) CYP1A2HTTPKMMEN1KMT2A
SCHEMBL4197565 0.92 EPHX1 (0.42) CYP1A2HTTPKMMEN1KMT2A
SCHEMBL11779058 0.92 EPHX1 (0.42) CYP1A2HTTPKMMEN1KMT2A
SCHEMBL13086429 0.92 EPHX1 (0.42) CYP1A2HTTPKMMEN1KMT2A
SCHEMBL9644650 0.89 CYP1A2 (0.56) CYP1A2POLBHPGDHTTLMNA
SCHEMBL20901395 0.87 PTGS1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111542530-B Epoxy resin containing phosphoric anhydride 蓝立方知识产权有限责任公司 2023-08-22 CN claimed
CN-117586478-A Curable composition, cured product thereof, and wafer level lens 株式会社大赛璐 2024-02-23 CN disclosed
CN-116917399-A Composition for forming release layer and release layer 日产化学株式会社 2023-10-20 CN disclosed
US-20230312834-A1 ASPARTIC ACID ESTER-FUNCTIONAL POLYSILOXANES, THEIR PREPARATION AND USE THEREOF MOMENTIVE PERFORMANCE MAT GMBH (DE) 2023-10-05 US disclosed
WO-2023152299-A1 ASPARTIC ACID ESTER-FUNCTIONAL POLYSILOXANES, THEIR PREPARATION AND USE THEREOF MOMENTIVE PERFORMANCE MATERIALS GMBH (DE) 2023-08-17 WO disclosed
CN-111093963-B Formed body 株式会社大赛璐 2022-02-25 CN disclosed
CN-107709401-B Curable composition and molded article 株式会社大赛璐 2020-06-09 CN disclosed
CN-111093963-A Formed body 株式会社大赛璐 2020-05-01 CN disclosed
US-9777107-B2 Silicone-modified epoxy resin and composition and cured article thereof SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-03 US disclosed
US-20170066969-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT CHI MEI CORPORATION (TW) 2017-03-09 US disclosed
US-20170066969-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT CHI MEI CORPORATION (TW) 2017-03-09 US disclosed
US-9127114-B2 Curable fluorine-containing polymer composition DAIKIN INDUSTRIES, LTD. (JP) 2015-09-08 US disclosed
US-9096708-B2 Partially esterified epoxy resin and epoxy resin composition applied with the same, and method for preparing the composition INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2015-08-04 US disclosed
US-20140113994-A1 PARTIALLY ESTERIFIED EPOXY RESIN AND EPOXY RESIN COMPOSITION APPLIED WITH THE SAME, AND METHOD FOR PREPARING THE COMPOSITION INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2014-04-24 US disclosed
US-20070015082-A1 Process of making a lithographic structure using antireflective materials INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-01-18 US disclosed
US-4056480-A DI-PHOSPHATES OR PHOSPHORAMIDATES MONSANTO COMPANY (US) 1977-11-01 US disclosed
US-3976585-A Functional fluid compositions containing epoxide stabilizers MONSANTO COMPANY (US) 1976-08-24 US disclosed