Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.43 |
| ▸ | FABP7 | O15540 | 2/20 | 0.42 |
| ▸ | FABP5 | Q01469 | 2/20 | 0.42 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.42 |
| ▸ | CASP3 | P42574 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31369861 | 1.00 | KMT2A (0.50) | KMT2AEPHX2FABP7FABP5OPRD1 | |
| SCHEMBL31370166 | 1.00 | KMT2A (0.50) | KMT2AEPHX2FABP7FABP5OPRD1 | |
| SCHEMBL22636086 | 1.00 | KMT2A (0.50) | KMT2AEPHX2FABP7FABP5OPRD1 | |
| SCHEMBL29634835 | 1.00 | KMT2A (0.50) | KMT2AEPHX2FABP7FABP5OPRD1 | |
| SCHEMBL27041477 | 0.90 | KMT2A (0.55) | KMT2AEPHX2FABP7FABP5OPRD1 | |
| SCHEMBL22197915 | 0.90 | KMT2A (0.55) | KMT2AEPHX2FABP7FABP5OPRD1 | |
| SCHEMBL30759367 | 0.90 | KMT2A (0.55) | KMT2AEPHX2FABP7FABP5OPRD1 | |
| SCHEMBL27041463 | 0.90 | KMT2A (0.55) | KMT2AEPHX2FABP7FABP5OPRD1 | |
| SCHEMBL30759497 | 0.88 | KMT2A (0.55) | KMT2AEPHX2FABP7FABP5OPRD1 | |
| SCHEMBL31693430 | 0.86 | KMT2A (0.54) | KMT2AEPHX2FABP7FABP5OPRD1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |