⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL867132 | 0.85 | — | — | |
| SCHEMBL11903920 | 0.85 | CYP1A2 (0.30) | — | |
| SCHEMBL11903797 | 0.85 | CYP1A2 (0.34) | — | |
| SCHEMBL11903864 | 0.83 | — | — | |
| SCHEMBL6130367 | 0.83 | CYP1A2 (0.38) | — | |
| SCHEMBL6130368 | 0.83 | CYP1A2 (0.38) | — | |
| SCHEMBL135139 | 0.83 | CYP1A2 (0.38) | — | |
| SCHEMBL6130369 | 0.83 | CYP1A2 (0.38) | — | |
| SCHEMBL11903769 | 0.82 | CYP1A2 (0.50) | — | |
| SCHEMBL11904199 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2487148-B1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2014-12-31 | — | — | EP | disclosed |
| EP-2487148-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-08-15 | — | — | EP | disclosed |