SCHEMBL11903586

SCHEMBL11903586

[CH2]CCC1C(C)CCCC1C

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA4 P22748 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11903749 0.78 CA1 (0.33) CA1CA2CA4
SCHEMBL9259852 0.77
SCHEMBL11903824 0.76 CA1 (0.36) CA1CA2CA4
SCHEMBL11903761 0.73
SCHEMBL11903781 0.72 CYP1A2 (0.46)
SCHEMBL7650632 0.72 CA1 (0.35) CA1CA2CA4
SCHEMBL11903941 0.72
SCHEMBL7887678 0.69 CA1 (0.35) CA1CA2CA4
SCHEMBL11903714 0.69
SCHEMBL17325047 0.69 EPHX1 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2487148-B1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2014-12-31 EP disclosed
EP-2487148-A1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-08-15 EP disclosed