SCHEMBL11903643

SCHEMBL11903643

C[CH]CCCC1CCCC(CCC)C1

nearest known ligand 0.43

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.43
CHRNA7 P36544 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11903770 0.92 CYP1A2 (0.54) CYP1A2
SCHEMBL11903833 0.88 CYP1A2 (0.39) CYP1A2
SCHEMBL11904201 0.88 CYP1A2 (0.37) CYP1A2CHRNA7
SCHEMBL11903842 0.84 CYP1A2 (0.54) CYP1A2
SCHEMBL11903665 0.83 CYP1A2 (0.62) CYP1A2CHRNA7
SCHEMBL12981825 0.83
SCHEMBL10972704 0.82 CYP1A2 (0.46) CYP1A2CHRNA7
SCHEMBL11904159 0.82 CYP1A2 (0.35) CYP1A2CHRNA7
SCHEMBL11903777 0.80 CYP1A2 (0.34) CYP1A2
SCHEMBL11903961 0.78 CYP1A2 (0.52) CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2487148-B1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2014-12-31 EP disclosed
EP-2487148-A1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-08-15 EP disclosed