SCHEMBL11904091

SCHEMBL11904091

CC[CH]CCC1CCC(C)C(C)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11903771 0.81
SCHEMBL1678376 0.80
SCHEMBL11903799 0.79
SCHEMBL16191326 0.78
SCHEMBL11904191 0.76 TLR4 (0.32)
SCHEMBL6905137 0.75
SCHEMBL11903948 0.74
SCHEMBL11903669 0.73 CYP1A2 (0.31)
SCHEMBL11903889 0.73
SCHEMBL11903679 0.72 CYP1A2 (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2487148-B1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2014-12-31 EP disclosed
EP-2487148-A1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-08-15 EP disclosed