SCHEMBL1191602

SCHEMBL1191602

CC1OOC1C(=O)OC(C)(C)C

nearest known ligand 0.40

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.40
DGAT1 O75907 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14968136 0.82 MAPK1 (0.42) MAPK1DGAT1
SCHEMBL7787915 0.78 MAPK1 (0.36) MAPK1DGAT1
SCHEMBL9015733 0.77 MAPK1 (0.35) MAPK1DGAT1
SCHEMBL18176808 0.77 MAPK1 (0.40) MAPK1DGAT1
SCHEMBL12309462 0.77 MAPK1 (0.40) MAPK1DGAT1
SCHEMBL27094496 0.76 MAPK1 (0.41) MAPK1DGAT1
SCHEMBL16272964 0.70 MAPK1 (0.43) MAPK1DGAT1
SCHEMBL30563026 0.69 MAPK1 (0.44) MAPK1
SCHEMBL14966926 0.67 MAPK1 (0.34) MAPK1
SCHEMBL28431731 0.67 MAPK1 (0.34) MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11784154-B2 Anisotropic conductive film and method of producing the same DEXERIALS CORPORATION (JP) 2023-10-10 US disclosed
US-11404391-B2 Anisotropic conductive film and method of producing the same DEXERIALS CORPORATION (JP) 2022-08-02 US disclosed
US-11348891-B2 2022-05-31 US disclosed
CN-107267076-B Method for manufacturing anisotropic conductive film and anisotropic conductive film 迪睿合电子材料有限公司 2021-06-29 CN disclosed
US-20200091105-A1 ANISOTROPIC CONDUCTIVE FILM AND METHOD OF PRODUCING THE SAME DEXERIALS CORPORATION (JP) 2020-03-19 US disclosed
US-20150214176-A1 ANISOTROPIC CONDUCTIVE FILM AND METHOD OF PRODUCING THE SAME DEXERIALS CORPORATION (JP) 2015-07-30 US disclosed
US-8389621-B2 Thermosetting resin composition for producing color filter for CMOS image sensor, color filter comprising transparent film formed using the composition and CMOS image sensor using the color filter CHEIL INDUSTRIES INC. (KR) 2013-03-05 US disclosed
US-20110037038-A1 Thermosetting Resin Composition for Producing Color Filter for CMOS Image Sensor, Color Filter Comprising Transparent Film Formed Using the Composition and CMOS Image Sensor Using the Color Filter CHEIL INDUSTRIES INC. (KR) 2011-02-17 US disclosed
US-7847013-B2 Glycidyl-, OH-, COOH- and aryl-(meth)acrylate copolymer for color filter CHEIL INDUSTRIES INC. (KR) 2010-12-07 US disclosed
US-7722932-B2 One solution-type thermosetting compositions for color filter protective films and color filters using the same CHEIL INDUSTRIES, INC. (KR) 2010-05-25 US disclosed
US-20080319145-A1 Thermosetting Resin Composition for Producing Color Filter for CMOS Image Sensor, Color Filter Comprising Transparent Film Formed Using the Composition and CMOS Image Sensor Using the Color Filter CHEIL INDUSTRIES INC. (KR) 2008-12-25 US disclosed
US-20080015283-A1 ONE SOLUTION-TYPE THERMOSETTING COMPOSITIONS FOR COLOR FILTER PROTECTIVE FILMS AND COLOR FILTERS USING THE SAME KPX CHEMICAL CO., LTD. (KR) 2008-01-17 US disclosed
US-20010021750-A1 Polymer compound, method of producing the same, photosensitive composition, and pattern formation method TOYO GOSEI KOGYO CO., LTD. (JP) 2001-09-13 US disclosed
EP-1117005-A1 Polymer compound, method of producing the same, photosensitive composition, and pattern formation method Toyo Gosei Kogyo Co., Ltd. (JP) 2001-07-18 EP disclosed