Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 5/20 | 0.65 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.49 |
| ▸ | RAB9A | P51151 | 1/20 | 0.49 |
| ▸ | NAAA | Q02083 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.45 |
| ▸ | FAAH | O00519 | 1/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13064256 | 1.00 | EPHX1 (0.65) | EPHX1ALDH1A1RAB9ANAAAKMT2A | |
| SCHEMBL13064257 | 1.00 | EPHX1 (0.65) | EPHX1ALDH1A1RAB9ANAAAKMT2A | |
| SCHEMBL11982333 | 0.87 | EPHX1 (0.50) | EPHX1ALDH1A1NAAAGAATSHR | |
| SCHEMBL13343848 | 0.85 | EPHX1 (0.60) | EPHX1ALDH1A1RAB9AKMT2AMEN1 | |
| SCHEMBL28177943 | 0.85 | EPHX1 (0.53) | EPHX1ALDH1A1RAB9ANAAAKMT2A | |
| SCHEMBL13081617 | 0.82 | EPHX1 (0.44) | EPHX1ALDH1A1KMT2AMEN1 | |
| SCHEMBL12196011 | 0.79 | EPHX1 (1.00) | EPHX1ALDH1A1RAB9ANAAAKMT2A | |
| SCHEMBL13131263 | 0.79 | EPHX1 (0.65) | EPHX1ALDH1A1RAB9ANAAAKMT2A | |
| SCHEMBL8393719 | 0.77 | EPHX1 (0.84) | EPHX1ALDH1A1RAB9AKMT2AMEN1 | |
| SCHEMBL1424064 | 0.77 | EPHX1 (0.84) | EPHX1ALDH1A1RAB9AKMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8236476-B2 | Multiple exposure photolithography methods and photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-08-07 | — | — | US | disclosed |
| US-20100304297-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-7838198-B2 | Photoresist compositions and method for multiple exposures with multiple layer resist systems | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-23 | — | — | US | disclosed |
| US-20090176174-A1 | MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS AND PHOTORESIST COMPOSTIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-09 | — | — | US | disclosed |
| US-20090155718-A1 | PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-18 | — | — | US | disclosed |
| US-7354521-B2 | Method of fabricating inkjet print head using photocurable resin composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-04-08 | — | — | US | disclosed |
| US-7341775-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO. LTD. (JP) | 2008-03-11 | — | — | US | disclosed |