Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP5 | Q01469 | 3/20 | 0.48 |
| ▸ | FABP7 | O15540 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.43 |
| ▸ | CASP3 | P42574 | 2/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5969982 | 0.87 | FABP5 (0.49) | FABP5FABP7KMT2AEPHX2CASP3 | |
| SCHEMBL13327270 | 0.84 | KMT2A (0.49) | FABP5FABP7KMT2AEPHX2CASP3 | |
| SCHEMBL13359306 | 0.82 | BCHE (0.48) | FABP5FABP7KMT2AEPHX2CASP3 | |
| SCHEMBL120280 | 0.82 | FABP5 (0.50) | FABP5FABP7KMT2AEPHX2CASP3 | |
| SCHEMBL2191905 | 0.82 | KMT2A (0.48) | FABP5FABP7KMT2AEPHX2CASP3 | |
| SCHEMBL31000592 | 0.81 | KMT2A (0.41) | FABP5FABP7KMT2AEPHX2CASP3 | |
| SCHEMBL2905231 | 0.81 | KMT2A (0.44) | FABP5FABP7KMT2AEPHX2CASP3 | |
| SCHEMBL31278102 | 0.81 | KMT2A (0.46) | FABP5FABP7KMT2AEPHX2CASP3 | |
| SCHEMBL21950699 | 0.81 | KMT2A (0.46) | FABP5FABP7KMT2AEPHX2CASP3 | |
| SCHEMBL30584150 | 0.80 | KMT2A (0.51) | FABP5FABP7KMT2AEPHX2CASP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |