SCHEMBL119444

SCHEMBL119444

O=C(NC[C@@H](NC(=O)OCC1c2ccccc2-c2ccccc21)C(=O)O)OCc1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MDM4 O15151 2/20 0.53
TP53 P04637 2/20 0.53
IDO1 P14902 2/20 0.53
TDO2 P48775 1/20 0.53
HDAC1 Q13547 1/20 0.51
HDAC2 Q92769 1/20 0.51
TNF P01375 1/20 0.51
KMT2A Q03164 2/20 0.50
TLR2 O60603 2/20 0.49
CASP3 P42574 2/20 0.48
SLC17A5 Q9NRA2 1/20 0.47
ITGB3 P05106 1/20 0.47
ITGAV P06756 1/20 0.47
ITGA2B P08514 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5203445 1.00 MDM4 (0.53) MDM4TP53IDO1TDO2HDAC1
SCHEMBL29400714 1.00 MDM4 (0.53) MDM4TP53IDO1TDO2HDAC1
SCHEMBL22552830 1.00 MDM4 (0.53) MDM4TP53IDO1TDO2HDAC1
SCHEMBL29401757 1.00 MDM4 (0.53) MDM4TP53IDO1TDO2HDAC1
SCHEMBL6290889 1.00 MDM4 (0.53) MDM4TP53IDO1TDO2HDAC1
SCHEMBL25168212 1.00 MDM4 (0.53) MDM4TP53IDO1TDO2HDAC1
SCHEMBL31220290 1.00 MDM4 (0.53) MDM4TP53IDO1TDO2HDAC1
SCHEMBL119688 0.93 MDM4 (0.59) MDM4TP53KMT2ATLR2CASP3
SCHEMBL5967446 0.93 MDM4 (0.59) MDM4TP53KMT2ATLR2CASP3
SCHEMBL31276348 0.93 MDM4 (0.59) MDM4TP53KMT2ATLR2CASP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8895231-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-25 US disclosed
US-20120058428-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 US disclosed
US-20120058428-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 US disclosed