⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25225764 | 0.74 | — | — | |
| SCHEMBL8059108 | 0.67 | — | — | |
| SCHEMBL24397763 | 0.67 | — | — | |
| SCHEMBL11950490 | 0.64 | — | — | |
| SCHEMBL26287910 | 0.61 | — | — | |
| SCHEMBL21882098 | 0.59 | — | — | |
| Dimethylamine SCHEMBL15412965 | 0.58 | — | — | |
| Dimethylamine SCHEMBL27808268 | 0.58 | — | — | |
| SCHEMBL21882126 | 0.55 | — | — | |
| SCHEMBL2269021 | 0.54 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8940380-B2 | Coating liquid for forming insulation film, insulation film using the same, and method for producing compound used in the same | ADEKA CORPORATION (JP) | 2015-01-27 | — | — | US | disclosed |
| US-20120192761-A1 | COATING LIQUID FOR FORMING INSULATION FILM, INSULATION FILM USING THE SAME, AND METHOD FOR PRODUCING COMPOUND USED IN THE SAME | ADEKA CORPORATION (JP) | 2012-08-02 | — | — | US | disclosed |