SCHEMBL11964672

SCHEMBL11964672

CCN(CC)c1ccc2c(-c3ccc(C)cc3C(=O)O)c3ccc(=[N+](CC)CC)cc-3oc2c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 3/20 0.60
▸ KMT2A Q03164 3/20 0.60
▸ BLM P54132 2/20 0.60
▸ USP2 O75604 2/20 0.60
▸ POLB P06746 1/20 0.60
▸ PPARG P37231 1/20 0.60
▸ RXFP1 Q9HBX9 1/20 0.60
▸ NCOR2 Q9Y618 1/20 0.60
▸ FPR2 P25090 4/20 0.48
▸ TGM2 P21980 1/20 0.48
▸ TLR7 Q9NYK1 1/20 0.48
▸ CHRM1 P11229 1/20 0.44
▸ P2RY6 Q15077 1/20 0.42
▸ THRB P10828 1/20 0.42
▸ RECQL P46063 1/20 0.42
▸ TDP1 Q9NUW8 1/20 0.42
▸ ALDH1A1 P00352 3/20 0.41
▸ HPGD P15428 2/20 0.41
▸ HSD17B10 Q99714 2/20 0.41
▸ KDM4E B2RXH2 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16253380 0.91 MEN1 (0.60) MEN1KMT2ABLMUSP2POLB
SCHEMBL13428310 0.90 USP2 (0.59) MEN1KMT2ABLMUSP2POLB
SCHEMBL29593395 0.90 MEN1 (0.61) MEN1KMT2ABLMUSP2POLB
SCHEMBL3903552 0.90 MEN1 (0.61) MEN1KMT2ABLMUSP2POLB
Hydrochloric Acid SCHEMBL29442119 0.89 USP2 (0.59) MEN1KMT2ABLMUSP2POLB
Hydrochloric Acid SCHEMBL29354092 0.89 MEN1 (0.60) MEN1KMT2ABLMUSP2POLB
Hydrochloric Acid SCHEMBL30207638 0.89 MEN1 (0.60) MEN1KMT2ABLMUSP2POLB
Hydrochloric Acid SCHEMBL18617 0.89 MEN1 (0.60) MEN1KMT2ABLMUSP2POLB
Hydrochloric Acid SCHEMBL10325011 0.88 MEN1 (0.59) MEN1KMT2ABLMUSP2POLB
Hydrochloric Acid SCHEMBL31337069 0.88 MEN1 (0.59) MEN1KMT2ABLMUSP2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9519079-B2 Coloring composition, colored pattern, color filter and method of producing the same, pattern forming method, solid-state imaging device, and image display device FUJIFILM CORPORATION (JP) 2016-12-13 — — US disclosed
US-20160313639-A1 PHOTOSENSITIVE RESIN COMPOSITION, PIXEL LAYER, PROTECTIVE FILM, SPACER, THIN-FILM TRANSISTOR, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY APPARATUS CHI MEI CORPORATION (TW) 2016-10-27 — — US disclosed
US-9470974-B2 Coloring composition, coloring radiation-sensitive composition, color filter and solid-state imaging device FUJIFILM CORPORATION (JP) 2016-10-18 — — US disclosed
US-9274419-B2 Blue photosensitive resin composition for color filter and application thereof CHI MEI CORPORATION (TW) 2016-03-01 — — US disclosed
US-9268063-B2 Colored radiation-sensitive composition, colored cured film, color filter, colored pattern forming method, color filter production method, solid-state image sensor, and image display device FUJIFILM CORPORATION (JP) 2016-02-23 — — US disclosed
US-20150268554-A1 BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION THEREOF CHI MEI CORPORATION (TW) 2015-09-24 — — US disclosed
US-9086532-B2 Blue photosensitive resin composition for color filter and uses thereof CHI MEI CORPORATION (TW) 2015-07-21 — — US disclosed
US-9081142-B2 Photosensitive resin composition for a color filter and uses thereof CHI MEI CORPORATION (TW) 2015-07-14 — — US disclosed
US-9081273-B2 Radiation-sensitive colored composition, color filter, method for producing a color pattern, method for producing color filter, solid-state imaging device, and liquid crystal display apparatus FUJIFILM CORPORATION (JP) 2015-07-14 — — US disclosed
US-20150042931-A1 BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND USES THEREOF CHI MEI CORPORATION (TW) 2015-02-12 — — US disclosed
US-20140346416-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR A COLOR FILTER AND USES THEREOF CHI MEI CORPORATION (TW) 2014-11-27 — — US disclosed
US-8852832-B2 Radiation-sensitive colored composition, color filter and method for producing the same, solid state image device, and liquid crystal display apparatus FUJIFILM CORPORATION (JP) 2014-10-07 — — US disclosed
US-20140151615-A1 COLORING COMPOSITION, COLORED CURED FILM, COLOR FILTER, MANUFACTURING METHOD OF THE SAME, AND SOLD STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2014-06-05 — — US disclosed
US-20140154429-A1 COLORING COMPOSITION, COLORED PATTERN, COLOR FILTER AND METHOD OF PRODUCING THE SAME, PATTERN FORMING METHOD, SOLID-STATE IMAGING DEVICE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2014-06-05 — — US disclosed
US-20130222738-A1 COLOR LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2013-08-29 — — US disclosed
US-20120242940-A1 RADIATION-SENSITIVE COLORED COMPOSITION, COLOR FILTER, METHOD FOR PRODUCING A COLOR PATTERN, METHOD FOR PRODUCING COLOR FILTER, SOLID-STATE IMAGING DEVICE, AND LIQUID CRYSTAL DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2012-09-27 — — US disclosed
US-20120202145-A1 RADIATION-SENSITIVE COLORED COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, SOLID STATE IMAGE DEVICE, AND LIQUID CRYSTAL DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2012-08-09 — — US disclosed
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