Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.62 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.40 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.39 |
| ▸ | CASP3 | P42574 | 2/20 | 0.39 |
| ▸ | DOT1L | Q8TEK3 | 1/20 | 0.37 |
| ▸ | FABP7 | O15540 | 1/20 | 0.36 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.36 |
| ▸ | TLR2 | O60603 | 1/20 | 0.36 |
| ▸ | TLR1 | Q15399 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL119596 | 0.97 | KMT2A (0.60) | KMT2AEPHX2OPRD1CASP3DOT1L | |
| SCHEMBL119411 | 0.93 | KMT2A (0.56) | KMT2AEPHX2OPRD1CASP3FABP7 | |
| SCHEMBL18041255 | 0.84 | KMT2A (0.61) | KMT2AEPHX2OPRD1CASP3FABP7 | |
| SCHEMBL31646021 | 0.83 | KMT2A (0.58) | KMT2AEPHX2OPRD1CASP3DOT1L | |
| SCHEMBL25357039 | 0.82 | KMT2A (0.54) | KMT2AEPHX2CASP3FABP7FABP5 | |
| SCHEMBL4599714 | 0.82 | KMT2A (0.54) | KMT2ACASP3TLR2TLR1 | |
| SCHEMBL31688567 | 0.82 | KMT2A (0.57) | KMT2AEPHX2OPRD1CASP3DOT1L | |
| SCHEMBL30037641 | 0.82 | KMT2A (0.54) | KMT2ACASP3TLR2TLR1 | |
| SCHEMBL13573482 | 0.82 | KMT2A (0.56) | KMT2ATLR2TLR1 | |
| SCHEMBL21544410 | 0.81 | KMT2A (0.64) | KMT2AEPHX2OPRD1CASP3DOT1L |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8895231-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120058428-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |