SCHEMBL11989210

SCHEMBL11989210

OC1C2CC3C(O2)C1OC31CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11989205 0.73 — —
SCHEMBL18022211 0.72 — —
SCHEMBL14601961 0.70 — —
SCHEMBL19410358 0.59 — —
SCHEMBL19419132 0.59 — —
SCHEMBL25627217 0.57 POLB (0.31) —
SCHEMBL2059619 0.57 POLB (0.31) —
SCHEMBL2743866 0.57 POLB (0.31) —
SCHEMBL19419143 0.57 POLB (0.31) —
SCHEMBL19410357 0.57 POLB (0.31) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8247166-B2 Double patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-21 — — US disclosed
US-20100062380-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-11 — — US disclosed
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