⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30730720 | 0.73 | — | — | |
| SCHEMBL323205 | 0.73 | — | — | |
| SCHEMBL310632 | 0.73 | — | — | |
| SCHEMBL134555 | 0.73 | — | — | |
| SCHEMBL80146 | 0.71 | — | — | |
| SCHEMBL19405530 | 0.71 | — | — | |
| Ethane SCHEMBL8667520 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL7045331 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL18334389 | 0.71 | — | — | |
| SCHEMBL18803450 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8835095-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-09-16 | — | — | US | disclosed |
| US-8778594-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20130022915-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120219905-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |