⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12009262 | 0.87 | — | — | |
| SCHEMBL13758539 | 0.81 | — | — | |
| SCHEMBL13758546 | 0.76 | SLC1A2 (0.31) | — | |
| SCHEMBL12009273 | 0.72 | CYP17A1 (0.30) | — | |
| SCHEMBL111551 | 0.69 | — | — | |
| SCHEMBL9608714 | 0.67 | — | — | |
| SCHEMBL30663525 | 0.67 | ABCB1 (0.30) | — | |
| SCHEMBL16263965 | 0.67 | MEN1 (0.30) | — | |
| SCHEMBL17875130 | 0.65 | — | — | |
| SCHEMBL22143429 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8252508-B2 | Positive photosensitive composition and method of forming resist pattern | FUJIFILM CORPORATION (JP) | 2012-08-28 | — | — | US | disclosed |
| US-7867697-B2 | Positive photosensitive composition and method of forming resist pattern | FUJIFILM CORPORATION (JP) | 2011-01-11 | — | — | US | disclosed |
| US-20100261117-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2010-10-14 | — | — | US | disclosed |