SCHEMBL120095

SCHEMBL120095

[CH2]CC(=C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL139642 0.79
Ammonia Solution, Strong SCHEMBL1694485 0.75
Ammonia Solution, Strong SCHEMBL2319672 0.75
SCHEMBL9070602 0.72
Bromide SCHEMBL29140693 0.72
SCHEMBL2121214 0.72
SCHEMBL2120629 0.72
Ethylene Glycol SCHEMBL1561052 0.69 TSHR (0.39)
SCHEMBL603727 0.69
SCHEMBL29329118 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1474 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118108878-A Organic polymer carrier and preparation method and application thereof 中国石油天然气股份有限公司 2024-05-31 CN claimed
CN-118108888-A Organic polymer carrier, Z-N catalyst, and preparation method and application thereof 中国石油天然气股份有限公司 2024-05-31 CN claimed
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
EP-4398285-A1 ADHESIVE COMPOSITION, MULTILAYER BODY, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2024-07-10 EP disclosed
CN-118295212-A Composition for forming resist underlayer film containing glycol structure 日产化学株式会社 2024-07-05 CN disclosed
US-20240218293-A1 CLEANING AGENT COMPOSITION AND CLEANING METHOD NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed
US-12025916-B2 Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added NISSAN CHEMICAL CORPORATION (JP) 2024-07-02 US disclosed
CN-113348165-B 1,2, 4-Triazin-3 (2H) -one compounds for the treatment of hyperproliferative diseases 拜耳股份有限公司 2024-06-25 CN disclosed
CN-114423739-B Improved enantioselective hydrogenation of 4-substituted 1, 2-dihydroquinolines in the presence of chiral iridium catalysts and additives 拜耳公司 2024-06-25 CN disclosed
CN-114126606-B Method for dispersing a biofilm comprising gram-negative bacteria Q生物股份有限公司 2024-06-21 CN disclosed
WO-2024128199-A1 RELEASER COMPOSITION FOR PHOTOIRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR PHOTOIRRADIATION RELEASE 日産化学株式会社 2024-06-20 WO disclosed
WO-2002032909-A1 CATIONIC GROUP-3 CATALYST SYSTEM EXXONMOBIL CHEMICAL PATENTS INC. (US) 2002-04-25 WO disclosed
US-6143198-A SUITABLE FOR USE AS ELECTRO-OPTICAL DISPLAY MATERIALS; LIQUID CRYSTALLINE COMPOUND HAVING A LARGE ELASTIC CONSTANT RATIO, EXCELLENT COMPATIBILITY WITH OTHER LIQUID CRYSTALLINE COMPOUND, AND LOW TEMPERATURE CHEMICAL STABILITY CHISSO CORPORATION (JP) 2000-11-07 US disclosed
EP-0934941-A1 BENZOPIPERIDINE DERIVATIVES Eisai Co., Ltd. (JP) 1999-08-11 EP disclosed
EP-0877730-A1 ARYL ACRYLICS FOR USE AS FUNGICIDE MONSANTO COMPANY (US) 1998-11-18 EP disclosed
US-5739140-A AGRICULTURAL FUNGICIDES MONSANTO COMPANY (US) 1998-04-14 US disclosed
EP-0828700-A1 LIQUID CRYSTALLINE COMPOUNDS HAVING EXO-METHYLENE SITE AND LIQUID CRYSTAL COMPOSITIONS COMPRISING THE SAME CHISSO CORPORATION (JP) 1998-03-18 EP disclosed
WO-1997016413-A9 ARYL ACRYLICS FOR USE AS FUNGICIDE 1997-08-14 WO disclosed
WO-1997016413-A1 ARYL ACRYLICS FOR USE AS FUNGICIDE MONSANTO COMPANY (US) 1997-05-09 WO disclosed
WO-1996037451-A1 LIQUID CRYSTALLINE COMPOUNDS HAVING EXO-METHYLENE SITE AND LIQUID CRYSTAL COMPOSITIONS COMPRISING THE SAME CHISSO CORPORATION (JP) 1996-11-28 WO disclosed