SCHEMBL12015508

SCHEMBL12015508

O=C(OC1CCCCC1N1CCOCC1)C(F)(F)SOOO

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ SLC18A3 Q16572 3/20 0.34
▸ KCNA5 P22460 2/20 0.34
▸ SCN5A Q14524 2/20 0.34
▸ ALDH1A1 P00352 1/20 0.31
▸ HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12015481 0.80 SLC18A3 (0.40) SLC18A3KCNA5SCN5AALDH1A1HPGD
SCHEMBL12017268 0.77 SLC18A3 (0.36) SLC18A3KCNA5SCN5AALDH1A1HPGD
SCHEMBL2603023 0.75 GSR (0.33) —
SCHEMBL2603019 0.72 GSR (0.30) —
SCHEMBL2602926 0.72 CYP19A1 (0.35) —
SCHEMBL12165452 0.71 SLC18A3 (0.39) SLC18A3KCNA5SCN5AALDH1A1HPGD
SCHEMBL2602927 0.70 CYP19A1 (0.37) —
SCHEMBL2602944 0.70 CYP19A1 (0.37) —
SCHEMBL2602968 0.70 CYP19A1 (0.37) —
SCHEMBL2602991 0.69 POLB (0.32) ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574812-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-11-05 — — US disclosed
US-20120219906-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-30 — — US disclosed
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