SCHEMBL12040232

SCHEMBL12040232

CCC(C)C(=O)CC(=O)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CXCR2 P25025 2/20 0.36
STS P08842 7/20 0.35
CXCR1 P25024 1/20 0.33
HDAC3 O15379 2/20 0.32
HDAC4 P56524 2/20 0.32
HDAC1 Q13547 2/20 0.32
HDAC7 Q8WUI4 2/20 0.32
HDAC2 Q92769 2/20 0.32
HDAC10 Q969S8 2/20 0.32
HDAC11 Q96DB2 2/20 0.32
HDAC8 Q9BY41 2/20 0.32
HDAC6 Q9UBN7 2/20 0.32
HDAC9 Q9UKV0 2/20 0.32
HDAC5 Q9UQL6 2/20 0.32
EGFR P00533 1/20 0.31
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
ALOX15 P16050 1/20 0.31
APEX1 P27695 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12398788 0.87 CXCR2 (0.36) CXCR2STSCXCR1TDP1PTPN1
SCHEMBL12040221 0.87 STS (0.38) CXCR2STSCXCR1HDAC3HDAC4
SCHEMBL12040250 0.85 STS (0.38) CXCR2STSHDAC3HDAC4HDAC1
SCHEMBL17953183 0.84 STS (0.41) CXCR2STSALDH1A1LMNAMAPK1
SCHEMBL10204338 0.82 HDAC3 (0.36) CXCR2STSHDAC3HDAC4HDAC1
SCHEMBL16638155 0.81 STS (0.45) STSALDH1A1LMNAMAPK1RECQL
SCHEMBL10204332 0.81 PTPN1 (0.32) CXCR2STSHDAC3HDAC4HDAC1
SCHEMBL12399049 0.81 STS (0.47) CXCR2STSMAPK1PTPN1GAA
SCHEMBL16638142 0.81 GAA (0.51) CXCR2STSALDH1A1GAA
SCHEMBL17358332 0.81 CXCR2 (0.36) CXCR2STSCXCR1GAAEPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9052590-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-06-09 US disclosed
US-20110318693-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-12-29 US disclosed
US-20110183263-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed