SCHEMBL12110235

SCHEMBL12110235

O=C(Oc1ccc(S)cc1)c1ccccn1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 7/20 0.66
▸ KDM4E B2RXH2 6/20 0.66
▸ POLB P06746 2/20 0.66
▸ ALDH1A1 P00352 6/20 0.58
▸ L3MBTL1 Q9Y468 5/20 0.58
▸ SMN1; SMN2 Q16637 4/20 0.58
▸ TP53 P04637 1/20 0.53
▸ GAA P10253 1/20 0.53
▸ KMT2A Q03164 4/20 0.51
▸ TDP1 Q9NUW8 2/20 0.51
▸ CES2 O00748 1/20 0.48
▸ CES1 P23141 1/20 0.48
▸ LMNA P02545 1/20 0.47
▸ NAPRT Q6XQN6 1/20 0.47
▸ P4HTM Q9NXG6 1/20 0.47
▸ F2 P00734 1/20 0.46
▸ NPC1 O15118 5/20 0.44
▸ RAB9A P51151 5/20 0.44
▸ PKM P14618 3/20 0.44
▸ MEN1 O00255 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30185288 0.86 MAPT (0.69) MAPTKDM4EPOLBALDH1A1L3MBTL1
SCHEMBL3961211 0.86 MAPT (0.69) MAPTKDM4EPOLBALDH1A1L3MBTL1
SCHEMBL5258714 0.83 MAPT (0.66) MAPTKDM4EPOLBALDH1A1L3MBTL1
SCHEMBL28490620 0.83 MAPT (0.66) MAPTKDM4EPOLBALDH1A1L3MBTL1
SCHEMBL31664396 0.82 KDM4E (0.68) MAPTKDM4EPOLBALDH1A1L3MBTL1
SCHEMBL7422658 0.80 MAPT (0.61) MAPTKDM4EPOLBALDH1A1L3MBTL1
SCHEMBL27665086 0.80 MAPT (1.00) MAPTKDM4EPOLBALDH1A1L3MBTL1
SCHEMBL12108493 0.80 MAPT (0.61) MAPTKDM4EPOLBALDH1A1L3MBTL1
SCHEMBL8701481 0.78 KMT2A (0.62) MAPTKDM4EPOLBALDH1A1L3MBTL1
SCHEMBL29053183 0.76 MAPT (0.72) MAPTKDM4EPOLBALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110269072-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2011-11-03 — — US disclosed
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