Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 5/20 | 0.47 |
| ▸ | CYP19A1 | P11511 | 5/20 | 0.47 |
| ▸ | PRKCA | P17252 | 1/20 | 0.44 |
| ▸ | SCN1A | P35498 | 1/20 | 0.38 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.38 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | XBP1 | P17861 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | GLA | P06280 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16938867 | 0.87 | CYP17A1 (0.49) | CYP17A1CYP19A1PRKCASCN1ASCN2A | |
| SCHEMBL6367597 | 0.85 | CYP17A1 (0.48) | CYP17A1CYP19A1PRKCASCN1ASCN2A | |
| SCHEMBL16589179 | 0.84 | CYP17A1 (0.47) | CYP17A1CYP19A1PRKCASCN1ASCN2A | |
| SCHEMBL16731584 | 0.81 | CYP17A1 (0.50) | CYP17A1CYP19A1PRKCASCN1ASCN2A | |
| SCHEMBL16731576 | 0.81 | CYP17A1 (0.50) | CYP17A1CYP19A1PRKCASCN1ASCN2A | |
| SCHEMBL16731585 | 0.81 | CYP17A1 (0.50) | CYP17A1CYP19A1PRKCASCN1ASCN2A | |
| SCHEMBL16169967 | 0.81 | CYP17A1 (0.45) | CYP17A1CYP19A1PRKCASCN1ASCN2A | |
| SCHEMBL16382610 | 0.81 | CYP17A1 (0.42) | CYP17A1CYP19A1PRKCASCN1ASCN2A | |
| SCHEMBL120312 | 0.80 | CYP17A1 (0.44) | CYP17A1CYP19A1PRKCASCN1ASCN2A | |
| SCHEMBL16731832 | 0.77 | CYP17A1 (0.55) | CYP17A1CYP19A1PRKCASCN1ASCN2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110269072-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| EP-2101217-B1 | Sulfonium salt-containing polymer, resist compositon, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-05-11 | — | — | EP | disclosed |
| EP-2112554-A2 | Sulfonium salt-containing polymer, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-10-28 | — | — | EP | disclosed |
| EP-2105794-A1 | Novel photoacid generator, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-30 | — | — | EP | disclosed |