⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1344770 | 1.00 | — | — | |
| SCHEMBL17493167 | 1.00 | — | — | |
| Magnesium SCHEMBL31375202 | 0.91 | — | — | |
| SCHEMBL16228267 | 0.91 | — | — | |
| SCHEMBL7131063 | 0.91 | — | — | |
| SCHEMBL3788828 | 0.91 | — | — | |
| SCHEMBL131 | 0.89 | — | — | |
| SCHEMBL7648816 | 0.84 | — | — | |
| Methane SCHEMBL20598813 | 0.80 | — | — | |
| Phosphine SCHEMBL22972928 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 6362 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12527055-B2 | Fabrication of silicon carbide integrated power MOSFETs on a single substrate | CoolCAD Electronics, LLC (US) | 2026-01-13 | — | — | US | claimed |
| CN-120161215-A | MEMS triaxial accelerometer with self-checking function and preparation method thereof | 合肥工业大学 | 2025-06-17 | — | — | CN | claimed |
| CN-120145733-A | Stable numerical simulation method for total ionization dose and instantaneous dose rate synergistic effect in semiconductor device | 浙江大学 | 2025-06-13 | — | — | CN | claimed |
| CN-113659115-B | Process for preparing multi-stage structure silicon lithium battery negative electrode by diatomite | 山东省泥博士新型材料有限公司 | 2025-01-03 | — | — | CN | claimed |
| CN-119191307-A | Synthesis method and application of rare earth silicate nano composite powder for environmental barrier coating | 哈尔滨工程大学 | 2024-12-27 | — | — | CN | claimed |
| CN-118261091-B | Method and system for analyzing total dose effect of silicon-based MOSFET | 南京理工大学 | 2024-12-03 | — | — | CN | claimed |
| CN-115114829-B | Multi-level failure modeling method for power semiconductor device for simulating chip interface material mutual fusion mechanism | 重庆大学 | 2024-11-26 | — | — | CN | claimed |
| CN-118867240-A | Lithium ion cylindrical battery and power utilization device | 江苏睿恩新能源科技有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-118553788-A | Vertical structure nano air channel triode and preparation method thereof | 电子科技大学 | 2024-08-27 | — | — | CN | claimed |
| CN-118549507-A | Ultrasensitive biomolecule detection method based on graphene field effect transistor | 首都医科大学 | 2024-08-27 | — | — | CN | claimed |
| US-4957846-A | PHOTORESISTS, PHOTOLITHOGRAPHY, PRINTED CIRCUITS | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-09-18 | — | — | US | claimed |
| WO-1990007538-A1 | SELECTED TRINUCLEAR NOVOLAK OLIGOMERS AND THEIR USE IN PHOTOACTIVE COMPOUNDS AND RADIATION SENSITIVE MIXTURES | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-07-12 | — | — | WO | claimed |
| EP-0365340-A2 | Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene | HOECHST CELANESE CORPORATION (US) | 1990-04-25 | — | — | EP | claimed |
| US-4902603-A | Photoresist compositions containing selected 6-acetoxy cyclohexadienone photosensitizers and novolak resins | OLIN CORPORATION (US) | 1990-02-20 | — | — | US | claimed |
| WO-1990000571-A1 | THERMALLY STABLE PHENOLIC RESIN COMPOSITIONS AND THEIR USE IN LIGHT-SENSITIVE COMPOSITIONS | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-01-25 | — | — | WO | claimed |
| US-4837121-A | POSITIVE-WORKING PHOTORESISTS | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1989-06-06 | — | — | US | claimed |
| EP-0297825-A1 | Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters and their use in light-sensitive mixtures | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1989-01-04 | — | — | EP | claimed |
| US-4588670-A | Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist | AMERICAN HOECHST CORPORATION (US) | 1986-05-13 | — | — | US | claimed |
| US-4472212-A | Method for fabricating a semiconductor device | AT&T BELL LABORATORIES (US) | 1984-09-18 | — | — | US | claimed |
| US-4184896-A | Surface barrier tailoring of semiconductor devices utilizing scanning electron microscope produced ionizing radiation | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) | 1980-01-22 | — | — | US | claimed |