⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10168169 | 0.74 | — | — | |
| SCHEMBL10188302 | 0.74 | — | — | |
| SCHEMBL12237608 | 0.71 | — | — | |
| SCHEMBL13829035 | 0.71 | — | — | |
| SCHEMBL14727567 | 0.70 | — | — | |
| SCHEMBL10819527 | 0.70 | — | — | |
| SCHEMBL13829252 | 0.67 | — | — | |
| SCHEMBL18535375 | 0.65 | — | — | |
| SCHEMBL13883634 | 0.62 | — | — | |
| SCHEMBL16807892 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120288796-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20110262865-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2011-10-27 | — | — | US | disclosed |
| US-20090111020-A1 | ANODE AND METHOD OF MANUFACTURING THE SAME, AND SECONDARY BATTERY | SONY CORPORATION (JP) | 2009-04-30 | — | — | US | disclosed |