⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28887907 | 0.71 | — | — | |
| SCHEMBL10060639 | 0.64 | — | — | |
| SCHEMBL106618 | 0.61 | — | — | |
| SCHEMBL13101124 | 0.60 | — | — | |
| SCHEMBL12378053 | 0.58 | — | — | |
| SCHEMBL677529 | 0.58 | — | — | |
| SCHEMBL773635 | 0.56 | — | — | |
| SCHEMBL107491 | 0.56 | — | — | |
| SCHEMBL251075 | 0.52 | — | — | |
| SCHEMBL1261054 | 0.51 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9826129-B2 | Near-infrared-ray-absorbing composition, near-infrared-ray cut filter using same, manufacturing method therefor, camera module, and manufacturing method therefor | FUJIFILM CORPORATION (JP) | 2017-11-21 | — | — | US | disclosed |
| US-20160037034-A1 | NEAR-INFRARED-RAY-ABSORBING COMPOSITION, NEAR-INFRARED-RAY CUT FILTER USING SAME, MANUFACTURING METHOD THEREFOR, CAMERA MODULE, AND MANUFACTURING METHOD THEREFOR | FUJIFILM CORPORATION (JP) | 2016-02-04 | — | — | US | disclosed |
| US-8021822-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-20 | — | — | US | disclosed |
| US-20090186296-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |