Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | CA12 | O43570 | 2/20 | 0.38 |
| ▸ | F13A1 | P00488 | 2/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.38 |
| ▸ | CA4 | P22748 | 2/20 | 0.38 |
| ▸ | CA6 | P23280 | 2/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.38 |
| ▸ | CA5A | P35218 | 2/20 | 0.38 |
| ▸ | THPO | P40225 | 2/20 | 0.38 |
| ▸ | CA7 | P43166 | 2/20 | 0.38 |
| ▸ | CA9 | Q16790 | 2/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.38 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | CASP2 | P42575 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1230682 | 0.94 | CYP1A2 (0.42) | CYP1A2TSHRCA12F13A1CA2 | |
| SCHEMBL8764297 | 0.94 | CYP1A2 (0.42) | CYP1A2TSHRCA12F13A1CA2 | |
| SCHEMBL5098312 | 0.94 | CYP1A2 (0.42) | CYP1A2TSHRCA12F13A1CA2 | |
| SCHEMBL10838909 | 0.94 | CYP1A2 (0.42) | CYP1A2TSHRCA12F13A1CA2 | |
| SCHEMBL5098259 | 0.94 | CYP1A2 (0.42) | CYP1A2TSHRCA12F13A1CA2 | |
| SCHEMBL5094912 | 0.90 | CYP1A2 (0.40) | CYP1A2TSHRCA12F13A1CA2 | |
| SCHEMBL1064909 | 0.87 | CYP1A2 (0.42) | CYP1A2TSHRCA12F13A1CA2 | |
| SCHEMBL4934708 | 0.87 | — | — | |
| SCHEMBL9487092 | 0.83 | CA12 (0.47) | CYP1A2TSHRCA12F13A1CA2 | |
| SCHEMBL25319285 | 0.82 | CA12 (0.58) | CYP1A2TSHRCA12F13A1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8658346-B2 | Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-25 | — | — | US | disclosed |
| US-8426105-B2 | Resist-modifying composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-8329384-B2 | Resist-modifying composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-11 | — | — | US | disclosed |
| US-20110033799-A1 | PATTERN FORMING PROCESS, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST-MODIFYING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20100297554-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100297563-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |