⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ether SCHEMBL28452342 | 0.97 | GAA (0.55) | — | |
| Ammonia Solution, Strong SCHEMBL28285408 | 0.97 | GAA (0.55) | — | |
| SCHEMBL27893128 | 0.97 | GAA (0.55) | — | |
| Chloromethane SCHEMBL27511196 | 0.95 | GAA (0.52) | — | |
| Formaldehyde SCHEMBL9514376 | 0.95 | GAA (0.52) | — | |
| Cyanide SCHEMBL27895257 | 0.93 | GAA (0.50) | — | |
| Benzene SCHEMBL28173585 | 0.93 | GAA (0.50) | — | |
| Acetic Acid SCHEMBL27739709 | 0.93 | GAA (0.50) | — | |
| SCHEMBL2682415 | 0.92 | GAA (0.60) | — | |
| Butanone SCHEMBL11314544 | 0.91 | GAA (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 11127 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147279-A1 | DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2026-05-28 | — | — | US | claimed |
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| WO-2025106703-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| CN-119799505-A | Natural geotrichum candidum (Geotrichum candidum) and application thereof | 蘑米(广州)生物科技有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-119192115-B | New method for synthesizing 2-ethoxymethyl-primary ketone | 内蒙古医科大学 | 2025-04-04 | — | — | CN | claimed |
| CN-119620541-A | Preparation and application of bottom anti-reflection coating with high etching rate | 儒芯微电子材料（上海）有限公司 | 2025-03-14 | — | — | CN | claimed |
| US-20250021002-A1 | BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF | CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) | 2025-01-16 | — | — | US | claimed |
| CN-119212779-A | Hydrophilic membranes for filtration | 恩特格里斯公司 | 2024-12-27 | — | — | CN | claimed |
| CN-119192115-A | New method for synthesizing 2-ethoxymethyl-primary ketone | 内蒙古医科大学 | 2024-12-27 | — | — | CN | claimed |
| US-4673742-A | ALIPHATIC DIOL OR TRIOL OR DERIVATIVE AS SOLVENT SYSTEM | BASF AKTIENGESELLSCHAFT (DE) | 1987-06-16 | — | — | US | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |
| US-4618635-A | RADIATION CURABLE; HIGH TENSILE STRENGTH | UNION CARBIDE CORPORATION (US) | 1986-10-21 | — | — | US | claimed |
| US-4585702-A | CURED POLYMERIC BINDER COMPRISING LACTONE-ACRYLATE ADDUCT | UNION CARBIDE CORPORATION (US) | 1986-04-29 | — | — | US | claimed |
| EP-0133908-A2 | Compositions useful in curable coatings | UNION CARBIDE CORPORATION (US) | 1985-03-13 | — | — | EP | claimed |
| EP-0130088-A2 | Plasma developable negative resist compositions for electron beam, X-ray and optical lithography | TEXAS INSTRUMENTS INCORPORATED (US) | 1985-01-02 | — | — | EP | claimed |
| US-4459326-A | POLYURETHANES | HILLYARD ENTERPRISES, INC. (US) | 1984-07-10 | — | — | US | claimed |
| EP-0088529-A2 | Process for producing alkoxyacetic esters | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1983-09-14 | — | — | EP | claimed |
| US-4222918-A | POLYEPOXIDE COMPOUND, THERMO PLASTIC RESIN, AND CURING AGENT | DESOTO, INC. (US) | 1980-09-16 | — | — | US | claimed |
| US-4111928-A | METHOD OF SEPARATING LIGNIN AND MAKING EPOXIDE-LIGNIN | HOLSOPPLE DALE B | 1978-09-05 | — | — | US | claimed |