SCHEMBL12334010

SCHEMBL12334010

CC(=O)OC1CC2CC1CC2CC(C)(O)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 3/20 0.30
MEN1 O00255 1/20 0.30
CYP2D6 P10635 1/20 0.30
KMT2A Q03164 1/20 0.30
CHRM1 P11229 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14707431 0.87 CHRM2 (0.33) CHRM2MEN1CYP2D6KMT2ACHRM1
SCHEMBL775914 0.87
SCHEMBL776340 0.84
SCHEMBL1627358 0.84
SCHEMBL12939481 0.84
SCHEMBL12939476 0.83
SCHEMBL1628314 0.82
SCHEMBL12308119 0.79
SCHEMBL17281197 0.77
SCHEMBL9880665 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2011115138-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN FORMATION METHOD JSR株式会社 (JP) 2011-09-22 WO disclosed