SCHEMBL1235560

SCHEMBL1235560

FO[C]OF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10013504 0.62
SCHEMBL1321648 0.61
SCHEMBL3215285 0.59
SCHEMBL45345 0.53
SCHEMBL31042672 0.50
SCHEMBL31293457 0.50
SCHEMBL23878703 0.47
SCHEMBL10611491 0.47
Magnesium SCHEMBL224831 0.47
SCHEMBL369388 0.47

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118043728-A Spectacle lens, stain-proofing agent composition, and method for producing spectacle lens 豪雅镜片泰国有限公司 2024-05-14 CN disclosed
CN-118043729-A Spectacle lens, stain-proofing agent composition, and method for producing spectacle lens 豪雅镜片泰国有限公司 2024-05-14 CN disclosed
CN-115667195-B Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium 株式会社力森诺科 2024-04-09 CN disclosed
CN-117836268-A Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium 株式会社力森诺科 2024-04-05 CN disclosed
CN-117794895-A Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium 株式会社力森诺科 2024-03-29 CN disclosed
CN-114341205-B Silicone acrylates with perfluoropolyether groups 信越化学工业株式会社 2023-11-24 CN disclosed
CN-112236409-B Fullerene compound, lubricant for magnetic recording medium, and magnetic recording medium 株式会社力森诺科 2023-11-21 CN disclosed
CN-111103637-B Anti-reflection film 日东电工株式会社 2023-08-25 CN disclosed
CN-116635129-A Filter media comprising fluorinated water repellent additive and non-fluorinated water repellent additive 霍林斯沃思和沃斯有限公司 2023-08-22 CN disclosed
CN-116134350-A Polarizing film laminate 日东电工株式会社 2023-05-16 CN disclosed
WO-1990012833-A1 PROCESS FOR PREPARING PEROXIDIC PERFLUOROPOLYETHERS AUSIMONT S.R.L. (IT) 1990-11-01 WO disclosed
WO-1990012832-A1 PROCESS FOR THE PREPARATION OF PEROXIDIC PERFLUOROPOLYETHERS AUSIMONT S.R.L. (IT) 1990-11-01 WO disclosed
EP-0393700-A1 Process for the preparation of peroxidic perfluoropolyethers AUSIMONT S.p.A. (IT) 1990-10-24 EP disclosed
EP-0393705-A1 Process for preparing peroxidic perfluoropolyethers AUSIMONT S.r.l. (IT) 1990-10-24 EP disclosed
US-4898682-A PERFLUOROALKYL, OR ETHER, CARBONYL COMPONENTS AMIDATED WITH HETEROCYCLIC GROUPS DEKURA TAKATERU (JP) 1990-02-06 US disclosed
EP-0040923-B1 COMPOSITIONS FOR PROVIDING ABHERENT COATINGS; POLY (FLUOROOYALKYLENE) URETHANE ACRYLATES MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1985-05-02 EP disclosed
US-4383878-A RELEASE COATING OF RADIATION CURED POLYFLUORINATED ACRYLATE MONOMER, CURING AGENT AND POLYMER MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1983-05-17 US disclosed
US-4321404-A Compositions for providing abherent coatings MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1982-03-23 US disclosed
EP-0040923-A2 Compositions for providing abherent coatings; poly (fluorooyalkylene) urethane acrylates MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1981-12-02 EP disclosed
US-3950588-A Coating of silanol-reactive surfaces with di-silyl poly(perfluorooxyalkylenes) MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1976-04-13 US disclosed