SCHEMBL1237210

SCHEMBL1237210

N#CC(=Cc1ccc(Cl)cc1)c1ccc([N+](=O)[O-])cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.55
HTT P42858 4/20 0.55
NPC1 O15118 2/20 0.55
RAB9A P51151 2/20 0.55
MAPK1 P28482 1/20 0.55
MAOB P27338 2/20 0.55
MAOA P21397 1/20 0.55
CYP1A2 P05177 2/20 0.54
CYP3A4 P08684 2/20 0.54
HIF1A Q16665 1/20 0.54
SMN1; SMN2 Q16637 3/20 0.52
ALDH1A1 P00352 2/20 0.52
KDM4E B2RXH2 2/20 0.52
ESR1 P03372 2/20 0.51
ESR2 Q92731 2/20 0.51
CYP2D6 P10635 1/20 0.50
CYP2C9 P11712 1/20 0.50
HPGD P15428 1/20 0.50
CYP2C19 P33261 1/20 0.50
NPSR1 Q6W5P4 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10389792 1.00 MAPT (0.55) MAPTHTTNPC1RAB9AMAPK1
SCHEMBL7811587 1.00 MAPT (0.55) MAPTHTTNPC1RAB9AMAPK1
SCHEMBL10389793 1.00 MAPT (0.55) MAPTHTTNPC1RAB9AMAPK1
SCHEMBL10881593 0.93 MAPT (0.62) MAPTHTTNPC1RAB9AMAPK1
SCHEMBL10881599 0.93 MAPT (0.62) MAPTHTTNPC1RAB9AMAPK1
SCHEMBL10881590 0.93 MAPT (0.62) MAPTHTTNPC1RAB9AMAPK1
SCHEMBL11450371 0.93 MAPT (0.62) MAPTHTTNPC1RAB9AMAPK1
SCHEMBL11450372 0.93 MAPT (0.62) MAPTHTTNPC1RAB9AMAPK1
SCHEMBL10878146 0.88 MAPT (0.58) MAPTHTTNPC1RAB9AMAPK1
SCHEMBL10878150 0.88 MAPT (0.58) MAPTHTTNPC1RAB9AMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9295754-B2 Noggin inhibitory compositions for ossification and methods related thereto EMORY UNIVERSITY (US) 2016-03-29 US claimed
CN-115427479-B Resin, resin precursor composition, coating liquid composition, electrophotographic photoreceptor, method for producing electrophotographic photoreceptor, molded article, and electronic device 出光兴产株式会社 2025-03-04 CN disclosed
WO-2025023065-A1 POLYCARBONATE-POLYARYLATE RESIN, COATING COMPOSITION, MOLDED BODY, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR 出光興産株式会社 2025-01-30 WO disclosed
US-20240209144-A1 RESIN, RESIN COMPOSITION, COATING LIQUID COMPOSITION, FILM, COATING MEMBRANE, ELECTROPHOTOGRAPHY PHOTORECEPTOR, INSULATIVE MATERIAL, MOLDED PRODUCT, ELECTRONIC DEVICE, AND RESIN MANUFACTURING METHOD IDEMITSU KOSAN CO.,LTD. (JP) 2024-06-27 US disclosed
US-20230340194-A1 RESIN, RESIN PRECURSOR COMPOSITION, COATING COMPOSITION, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, MOLDED ARTICLE, ELECTRONIC DEVICE, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PRODUCTION METHOD IDEMITSU KOSAN CO.,LTD. (JP) 2023-10-26 US disclosed
CN-114276531-B Bischloroformate composition and its preparation method, polycarbonate resin and its preparation method, electrophotographic photoreceptor and electrophotographic device 出光兴产株式会社 2023-10-20 CN disclosed
EP-3431524-B1 POLYCARBONATE RESIN, METHOD FOR PRODUCING POLYCARBONATE RESIN, COATING LIQUID, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, AND ELECTROPHOTOGRAPHY DEVICE IDEMITSU KOSAN CO (JP) 2023-06-07 EP disclosed
EP-4130097-A1 RESIN, RESIN PRECURSOR COMPOSITION, COATING COMPOSITION, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, MOLDED ARTICLE, ELECTRONIC DEVICE, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PRODUCTION METHOD Idemitsu Kosan Co., Ltd (JP) 2023-02-08 EP disclosed
WO-2022211100-A1 RESIN, RESIN COMPOSITION, COATING LIQUID COMPOSITION, FILM, COATING MEMBRANE, ELECTROPHOTOGRAPHY PHOTORECEPTOR, INSULATIVE MATERIAL, MOLDED PRODUCT, ELECTRONIC DEVICE, AND RESIN MANUFACTURING METHOD 出光興産株式会社 2022-10-06 WO disclosed
EP-1757634-B2 POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER USING SAME IDEMITSU KOSAN CO (JP) 2022-05-25 EP disclosed
EP-0896975-A1 POLYCARBONATE, AND MOLDING AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1999-02-17 EP disclosed
US-5853930-A Electrophotographic photoconductors using bisazo compounds SHARP KABUSHIKI KAISHA (JP) 1998-12-29 US disclosed
EP-0866083-A1 POLYCARBONATE RESIN, CROSSLINKED POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR IDEMITSU KOSAN COMPANY LIMITED (JP) 1998-09-23 EP disclosed
EP-0837085-A1 POLYCARBONATE-BASE POLYMER, PRODUCTION PROCESS, RESIN COATING FLUID PREPARED THEREFROM, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1998-04-22 EP disclosed
EP-0780363-A1 Bisazo-benzofuran compounds, their use as charge carrier generating compounds and intermediates for their preparation SHARP KABUSHIKI KAISHA (JP) 1997-06-25 EP disclosed
US-5561017-A A CHARGE TRANSFER COMPOUND AND/OR BINDER COMPRISING A POLYESTER OR -CARBONATE OF AN ARYL HYDRAZONE MONOMER; ELECTROGRAPHY; PLATES; WEAR RESISTANCE IDEMITSU KOSAN CO., LTD. (JP) 1996-10-01 US disclosed
US-5506331-A POLYESTER OR POLYCARBONATE HAVING HYDRAZONE STRUCTURE IN REPEATING UNITS, USABLE AS CHARGE TRANSPORT MATERIAL OR BINDER RESIN IN CHARGE TRANSPORT LAYER IDEMITSU KOSAN CO., LTD. (JP) 1996-04-09 US disclosed
US-5501930-A Electrophotographic photoreceptor containing enamine derivative SHARP KABUSHIKI KAISHA (JP) 1996-03-26 US disclosed
US-5389479-A Excellent sensitivity in positive charge; multilayer consists of charge generating and charge transferring layer SHARP KABUSHIKI KAISHA (JP) 1995-02-14 US disclosed
EP-0597128-A1 ESTER POLYMER, PRODUCTION THEREOF, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR MADE THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1994-05-18 EP disclosed