Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | DPP4 | P27487 | 1/20 | 0.30 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15473007 | 0.91 | CYP1A2 (0.40) | CYP1A2 | |
| SCHEMBL16900295 | 0.83 | KDM4E (0.31) | CYP1A2 | |
| SCHEMBL47387 | 0.81 | HMGCR (0.32) | — | |
| SCHEMBL19084583 | 0.81 | — | — | |
| SCHEMBL16900292 | 0.80 | — | — | |
| SCHEMBL132884 | 0.80 | CYP1A2 (0.31) | CYP1A2 | |
| SCHEMBL14258820 | 0.79 | — | — | |
| SCHEMBL13607368 | 0.79 | — | — | |
| SCHEMBL16900289 | 0.79 | KDM4E (0.34) | CYP1A2 | |
| SCHEMBL13496203 | 0.79 | HMGCR (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1975705-B1 | Positive resist composition and pattern-forming method | FUJIFILM CORP (JP) | 2016-04-27 | — | — | EP | disclosed |
| US-9086624-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-21 | — | — | US | disclosed |
| US-9081290-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-14 | — | — | US | disclosed |
| US-9017931-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-8945810-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8945810-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2015-02-03 | — | — | US | disclosed |
| US-20140051026-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-20 | — | — | US | disclosed |
| US-20140045123-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-13 | — | — | US | disclosed |
| US-7998654-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2011-08-16 | — | — | US | disclosed |
| US-7998654-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2011-08-16 | — | — | US | disclosed |
| US-20080248425-A1 | Adjust solubility of alkali developer using acid; acid generator; actinic radiation | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080248425-A1 | Adjust solubility of alkali developer using acid; acid generator; actinic radiation | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| EP-1975705-A2 | Positive resist composition and pattern-forming method | FUJIFILM Corporation (JP) | 2008-10-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20140045123-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | MMAB, PARG, DNMT3A | CYP1A2 2048/4885DPP4 4351/4885RIPK1 391/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.