⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12236592 | 0.80 | — | — | |
| SCHEMBL5916261 | 0.75 | — | — | |
| SCHEMBL35296 | 0.72 | — | — | |
| Trimethylammonium SCHEMBL27331682 | 0.67 | — | — | |
| SCHEMBL27917221 | 0.67 | — | — | |
| SCHEMBL27771243 | 0.67 | — | — | |
| Ethane SCHEMBL3979179 | 0.67 | — | — | |
| SCHEMBL16758783 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL21073904 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL27747771 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9640386-B2 | Precursors for CVD silicon carbo-nitride films | VERSUM MATERIALS US, LLC (US) | 2017-05-02 | — | — | US | disclosed |
| US-20150147893-A1 | Precursors for CVD Silicon Carbo-Nitride Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-05-28 | — | — | US | disclosed |
| US-20150147893-A1 | Precursors for CVD Silicon Carbo-Nitride Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-05-28 | — | — | US | disclosed |
| US-8932675-B2 | Methods for depositing silicon carbo-nitride film | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-01-13 | — | — | US | disclosed |
| US-20130244448-A1 | Precursors for CVD Silicon Carbo-Nitride Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-09-19 | — | — | US | disclosed |
| US-20130244448-A1 | Precursors for CVD Silicon Carbo-Nitride Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-09-19 | — | — | US | disclosed |
| US-20110165346-A1 | Precursors for CVD Silicon Carbo-Nitride Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-07-07 | — | — | US | disclosed |
| US-7875312-B2 | silane precursor is reacted with an oxidizing agent; chemical vapor deposition; atomic layer deposition; facilitate formation of dielectric films at low thermal conditions; produce films having low acid etch rates; tune both the carbon and N2 content in the resulting silicon oxide film | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-01-25 | — | — | US | disclosed |
| US-20070275166-A1 | Process for producing silicon oxide films from organoaminosilane precursors | VERSUM MATERIALS US, LLC | 2007-11-29 | — | — | US | disclosed |
| CN-1325410-A | Polymerization of olefins | DU PONT (US) | 2001-12-05 | — | — | CN | disclosed |