Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL273190 | 0.93 | KDM4E (0.35) | KDM4ETSHRTDP1 | |
| SCHEMBL892007 | 0.73 | KDM4E (0.42) | KDM4ETSHRTDP1 | |
| SCHEMBL675792 | 0.71 | KDM4E (0.41) | KDM4ETSHRTDP1 | |
| SCHEMBL3964975 | 0.69 | TSHR (0.39) | KDM4ETSHRTDP1 | |
| SCHEMBL17044021 | 0.69 | TSHR (0.39) | KDM4ETSHRTDP1 | |
| SCHEMBL3969935 | 0.69 | TSHR (0.39) | KDM4ETSHRTDP1 | |
| SCHEMBL7785481 | 0.69 | TSHR (0.39) | KDM4ETSHRTDP1 | |
| SCHEMBL5971543 | 0.69 | TSHR (0.39) | KDM4ETSHRTDP1 | |
| SCHEMBL17044020 | 0.69 | TSHR (0.39) | KDM4ETSHRTDP1 | |
| SCHEMBL333613 | 0.69 | KDM4E (0.35) | KDM4ETSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2762976-A1 | Use of immersion liquids | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-08-06 | — | — | EP | disclosed |
| EP-1557721-B1 | Use of fluids for immersion lithography and pattern forming method | AIR PROD & CHEM (US) | 2014-08-06 | — | — | EP | disclosed |
| US-8007986-B2 | Immersion lithography fluids | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-08-30 | — | — | US | disclosed |
| US-7879531-B2 | Immersion lithography fluids | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-02-01 | — | — | US | disclosed |
| US-20070229795-A1 | Immersion Lithography Fluids | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-10-04 | — | — | US | disclosed |
| US-7211553-B2 | Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-05-01 | — | — | US | disclosed |
| US-20050173682-A1 | carrier medium and at least one additive such as alkyl polyglycoside, alkyl alcohol, or various ethylene oxide adducts; use at an operating wavelength ranging from 140 nm to 365 nm | AIR PRODUCTS AND CHEMICALS, INC. | 2005-08-11 | — | — | US | disclosed |
| US-20050161644-A1 | carrier medium and at least one additive such as alkyl polyglycoside, alkyl alcohol, or various ethylene oxide adducts; use at an operating wavelength ranging from 140 nm to 248 nm, and a refractive index greater than water at an operating wavelength | AIR PRODUCTS AND CHEMICALS, INC. | 2005-07-28 | — | — | US | disclosed |
| EP-1557721-A2 | Immersion lithography fluids | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-07-27 | — | — | EP | disclosed |
| US-20050029492-A1 | Processing of semiconductor substrates with dense fluids comprising acetylenic diols and/or alcohols | VERSUM MATERIALS US, LLC | 2005-02-10 | — | — | US | disclosed |
| US-20050029490-A1 | Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols | VERSUM MATERIALS US, LLC | 2005-02-10 | — | — | US | disclosed |
| EP-1505146-A1 | Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-02-09 | — | — | EP | disclosed |