SCHEMBL12423988

SCHEMBL12423988

C=CC(=O)OCNC(C)=O

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 10/20 0.47
HPGD P15428 1/20 0.45
ALDH1A1 P00352 8/20 0.45
HIF1A Q16665 4/20 0.45
TP53 P04637 3/20 0.45
CYP3A4 P08684 2/20 0.45
HSD17B10 Q99714 1/20 0.45
MAPK1 P28482 3/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
THRB P10828 3/20 0.38
TDP1 Q9NUW8 1/20 0.34
KDM4E B2RXH2 1/20 0.34
NPSR1 Q6W5P4 1/20 0.31
NFKB1 P19838 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18412201 0.82 HCAR2 (0.42) TSHRALDH1A1HIF1ATP53MAPK1
SCHEMBL28198324 0.82 TSHR (0.45) TSHRHPGDALDH1A1HIF1ATP53
SCHEMBL23746699 0.81 TSHR (0.45) TSHRHPGDALDH1A1HIF1ATP53
SCHEMBL27852886 0.80 TSHR (0.46) TSHRHPGDALDH1A1HIF1ATP53
SCHEMBL17522059 0.80 TSHR (0.52) TSHRHPGDALDH1A1HIF1ATP53
SCHEMBL2721018 0.79 TSHR (0.52) TSHRHPGDALDH1A1HIF1ATP53
SCHEMBL28330305 0.78 TSHR (0.50) TSHRHPGDALDH1A1HIF1ATP53
SCHEMBL15455703 0.78 TSHR (0.45) TSHRHPGDALDH1A1HIF1ATP53
SCHEMBL6033684 0.78 TSHR (0.46) TSHRHPGDALDH1A1HIF1ATP53
SCHEMBL1548464 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103339757-B The manufacture method of secondary cell perforated membrane slurry, secondary cell perforated membrane, electrode for secondary battery, secondary battery separator, secondary cell and secondary cell perforated membrane ZEON CORP. (JP) 2015-11-25 CN disclosed
CN-104012630-B A kind of rich selenium water shield bone crisp-fried and preparation method Lichuan City Duo Renduo Industrial Co., Ltd. (CN) 2015-11-18 CN disclosed
CN-105052644-A Selenium-enriched rice planting method GUANGXI XIEJI AGRICULTURE DEV CO LTD 2015-11-18 CN disclosed
CN-104285643-B The production method of rich selenium bamboo shoots DENG TIANHUA (CN) 2015-11-04 CN disclosed
CN-104905274-A Embedding and diluting method for L-selenium methyl selenocysteine UNIV NANCHANG 2015-09-16 CN disclosed
CN-104861137-A Foamed polyurethane with improved flex resistance BASF SE 2015-08-26 CN disclosed
CN-104305444-A Production method for natural bamboo juice rich in selenium DENG TIANHUA 2015-01-28 CN disclosed
CN-104285643-A Production method of selenium-enriched bamboo shoots DENG TIANHUA 2015-01-21 CN disclosed
CN-102138107-B Image forming toner, image forming apparatus, image forming method, and process cartridge RICOH KK 2014-12-03 CN disclosed
CN-104166320-A Toner, developer, and image forming apparatus RICOH CO LTD 2014-11-26 CN disclosed
CN-1768944-A Catalyst using phosphine-phosphoramidite ester as ligand, its preparation method and application DALIAN CHEMICAL PHYSICS INST (CN) 2006-05-10 CN disclosed
CN-1746194-A Process for preparing graft polyols using enol ethers as reaction moderators BASF CORP (US) 2006-03-15 CN disclosed
CN-1704421-A Cirality diphosphaneterpene and transition metal complex thereof LANXESS DE GMBH (DE) 2005-12-07 CN disclosed
CN-1662584-A Resin particle and method for prepartion thereof SANYO CHEMICAL IND LTD (JP) 2005-08-31 CN disclosed
CN-1653100-A Graft polyols prepared by a continuous process BASF CORP (US) 2005-08-10 CN disclosed
CN-1209397-C Resin dispersion having uniform particle size, resin particle, and method for producing same SANYO CHEMICAL IND LTD (JP) 2005-07-06 CN disclosed
CN-1582314-A Composite resin particle SANYO CHEMICAL IND LTD (JP) 2005-02-16 CN disclosed
CN-1142956-C Process for making graft polyols using t-amyl peroxy free radical initiator 2004-03-24 CN disclosed
CN-1400984-A Resin dispersions having uniform particle diameters, resin particles and processes for producing both SANYO CHEMICAL IND LTD (JP) 2003-03-05 CN disclosed
CN-1347426-A Method for preparing graft polyols using tert-amyl peroxy free radical initiators BASF CORP (US) 2002-05-01 CN disclosed