SCHEMBL12440777

SCHEMBL12440777

Cc1sc(-c2c(C)c(C)c(C)c(C)c2C)c(C)c1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12031560 0.86 — —
SCHEMBL12440768 0.84 — —
SCHEMBL13138690 0.82 — —
SCHEMBL13138684 0.81 — —
SCHEMBL13138688 0.79 — —
SCHEMBL13138685 0.79 — —
SCHEMBL12537266 0.78 — —
SCHEMBL15763733 0.78 — —
SCHEMBL13308992 0.75 — —
SCHEMBL16546138 0.74 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9318706-B2 Laminated structure, method for producing same, and electronic element comprising same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-04-19 — — US disclosed
US-8895675-B2 Block copolymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-11-25 — — US disclosed
US-20110177312-A1 LAMINATED STRUCTURE, METHOD FOR PRODUCING SAME, AND ELECTRONIC ELEMENT COMPRISING SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-21 — — US disclosed
US-20100219399-A1 BLOCK COPOLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-09-02 — — US disclosed
US-20100133476-A1 POLYMERIC ADSORPTION FILMS AND PROCESSES FOR PRODUCING THESE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-03 — — US disclosed
Send feedback