SCHEMBL12440779

SCHEMBL12440779

Cc1c(C)c(C)c(-c2c(C)c(C)c3c(sc4c(C)c(C)c(C)c(C)c43)c2C)c(C)c1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12440782 0.97
SCHEMBL2387847 0.88
SCHEMBL13335305 0.85
SCHEMBL13138690 0.80
SCHEMBL12440766 0.80
SCHEMBL16997301 0.79
SCHEMBL12668080 0.76 KDM4E (0.32)
SCHEMBL13308986 0.74
SCHEMBL12288452 0.74
SCHEMBL14769499 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9318706-B2 Laminated structure, method for producing same, and electronic element comprising same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-04-19 US disclosed
US-8895675-B2 Block copolymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-11-25 US disclosed
US-20110177312-A1 LAMINATED STRUCTURE, METHOD FOR PRODUCING SAME, AND ELECTRONIC ELEMENT COMPRISING SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-21 US disclosed
US-20100219399-A1 BLOCK COPOLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-09-02 US disclosed
US-20100133476-A1 POLYMERIC ADSORPTION FILMS AND PROCESSES FOR PRODUCING THESE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-03 US disclosed