SCHEMBL12443086

SCHEMBL12443086

C=CC(=O)Oc1c(Cc2cc(C)cc(CC(C)C)c2O)cc(C)cc1C(C)(C)C

nearest known ligand 0.48

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ CYP2C9 P11712 2/20 0.48
▸ CYP2C19 P33261 2/20 0.48
▸ HIF1A Q16665 2/20 0.48
▸ SMN1; SMN2 Q16637 2/20 0.48
▸ HSPA5 P11021 2/20 0.46
▸ CYP2D6 P10635 1/20 0.41
▸ HSD17B10 Q99714 1/20 0.41
▸ ALDH1A1 P00352 1/20 0.33
▸ CA2 P00918 1/20 0.33
▸ POLB P06746 1/20 0.33
▸ TYR P14679 1/20 0.33
▸ AMY1A P0DUB6 1/20 0.32
▸ VCAM1 P19320 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29362485 0.89 HSPA5 (0.60) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL29350305 0.89 HSPA5 (0.60) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL35108 0.89 HSPA5 (0.60) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
Methane SCHEMBL29094014 0.88 HSPA5 (0.58) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL7194890 0.87 HSPA5 (0.47) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL28983663 0.87 HSPA5 (0.46) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL13256688 0.85 CYP2C9 (0.32) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL13256692 0.85 HSPA5 (0.36) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL31083486 0.85 CYP2C9 (0.48) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5
SCHEMBL400673 0.84 CYP2C9 (0.47) CYP2C9CYP2C19HIF1ASMN1; SMN2HSPA5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140234640-A1 GAS BARRIER FILM, MANUFACTURING METHOD THEREOF, AND SUBSTRATE FOR ELECTRONIC ELEMENT USING THE SAME Konica Minolta, Inc. (JP) 2014-08-21 — — US disclosed
US-8569405-B2 Additive mixtures for styrenic polymers BASF SE (DE) 2013-10-29 — — US disclosed
US-20120298007-A1 PROCESS FOR PRODUCING CELLULOSE ESTER FILM, CELLULOSE ESTER FILM, POLARIZATION PLATE AND DISPLAY UNIT KONICA MINOLTA OPTO, INC. (JP) 2012-11-29 — — US disclosed
US-20110177338-A1 CARBON BLACK KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2011-07-21 — — US disclosed
US-7951310-B2 Nanophase carbon black grafted with organic compound in situ EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY (CN) 2011-05-31 — — US disclosed
US-20110046278-A1 ADDITIVE MIXTURES FOR STYRENIC POLYMERS BASF SE (US) 2011-02-24 — — US disclosed
US-20100164141-A1 Cellulose Ester Film, Its Manufacturing Method, Polarizing Plate, and Liquid Crystal Display KONICA MINOLTA OPTO, INC. (JP) 2010-07-01 — — US disclosed
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